Growth mechanism of indium nitride via sol-gel spin coating method and nitridation process

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• 作者：Zhi Yin Lee^a ; ^b ; ^{lee_zhiyin2003@yahoo.com} ; Sha Shiong Ng^a ; Fong Kwong Yam^b
• 关键词：Indium nitride ; Sol-gel spin coating method ; Nitridation process ; Characterizations ; Growth mechanism
• 刊名：Surface and Coatings Technology
• 出版年：2017
• 出版时间：25 January 2017
• 年：2017
• 卷：310
• 期：Complete
• 页码：38-42
• 全文大小：827 K
• 卷排序：310

文摘

A study on indium nitride growth mechanism deposited via spin coating and nitridation. Nitridation duration effects on films' structural and surface properties are revealed. Proposed works allow indium nitride growth at shorter reaction time without catalyst. Further, indium nitride growth at low temperature to resolve its thermal instability. Provide new framework for development of effective and constructive deposition method.