用户名: 密码: 验证码:
钨合金电化学腐蚀层性质的研究
详细信息    查看全文 | 推荐本文 |
  • 英文篇名:Research on the Characteristics of Electrochemical Corrosion Layer of Tungsten Alloy
  • 作者:周忠正 ; 金洙吉 ; 牛林 ; 刘作涛 ; 王泽北 ; 施远
  • 英文作者:ZHOU Zhongzheng;JIN Zhuji;NIU Lin;LIU Zuotao;WANG Zebei;SHI Yuan;Key Laboratory for Precision and Non-traditional Machining Technology of Ministry of Education,Dalian University of Technology;
  • 关键词:钨合金 ; 电化学腐蚀 ; 腐蚀层 ; 电解磨削 ; 腐蚀层厚度 ; 电化学参数
  • 英文关键词:tungsten alloy;;electrochemical corrosion;;corrosion layer;;electrochemical grinding;;thickness of corrosion layer;;electrochemical parameters
  • 中文刊名:XJXG
  • 英文刊名:New Technology & New Process
  • 机构:大连理工大学精密与特种加工教育部重点实验室;
  • 出版日期:2019-05-25
  • 出版单位:新技术新工艺
  • 年:2019
  • 期:No.377
  • 语种:中文;
  • 页:XJXG201905012
  • 页数:5
  • CN:05
  • ISSN:11-1765/T
  • 分类号:59-63
摘要
为了实现钨合金电解磨削加工过程中电化学作用和机械作用的平衡,通过碳酸钠溶液中钨合金电化学腐蚀试验,研究了钨合金表面在电化学作用下形成的腐蚀层的性质,以及电化学参数对腐蚀层的影响规律。试验结果表明,在选择性腐蚀作用下,钨合金中的硬质相钨颗粒被腐蚀溶解,留下一层由粘接相及其反应产物组成的多孔腐蚀层;电解液浓度、加工时间、加工电流和极间间隙等电化学参数对腐蚀层性质有显著的影响,通过调整电化学参数能够实现对腐蚀层厚度在20~100μm间的控制,研究结果可以为钨合金电解磨削过程中电化学参数的选择提供参考。
        In order to achieve the balance between electrochemical and mechanical action in the tungsten alloy electrochemical grinding(ECG),the electrochemical corrosion experiments in Na2 CO3 solution were conducted to study the characteristics of the forming corrosion layers under electrochemical action of tungsten alloy surface and the effect of electrochemical parameters on the corrosion layers.The results showed that under selective corrosion,hard tungsten particles was corroded and dissolved into the electrolyte and the generated porous corrosion layer was composed of the bonding phase and its reaction product.The electrochemical parameters such as electrolyte concentration,processing time,processing electric current,and inter-electrode gap had significant influence on the corrosion layers.By adjusting the electrochemical parameters,the thickness of the corrosion layer can be controlled from 20μm to 100μm,and the results can provide reference for the selection of electrochemical parameters in the tungsten alloy electrochemical grinding process.
引文
[1]Debata M,Acharya T S,Sengupta P,et al.Effect of high energy ball milling on structure and properties of 95W-3.5Ni-1.5Fe heavy alloys[J].International Journal of Refractory Metals and Hard Materials,2017,69:170-179.
    [2]胡兴军.高密度钨合金在弹用材料中的应用及研究进展[J].稀有金属与硬质合金,2009,37(3):65-67.
    [3]鲁利国,夏耀勤.钨合金的开发和应用现状[J].中国钨业,2008(3):37-39.
    [4]董志鹏.复杂型面端面电解磨削加工技术应用基础研究[D].南京:南京航空航天大学,2016.
    [5]孙元普.电解磨削加工钛合金基础试验研究[D].大连:大连理工大学,2014.
    [6]张坤领.硬脆材料加工技术发展现状[J].组合机床与自动化加工技术,2008(5):1-6.
    [7]于长春.电解磨削的运用及发展前景[J].黑龙江科技信息,2014(18):81-82.
    [8]叶而康,曲宁松,朱荻.GH4169电解磨削加工试验研究[J].机械制造与自动化,2016(6):24-27.
    [9]He Q,Jin Z,Jiang G,et al.The investigation on electrochemical denatured layer of 304stainless steel[J].Materials and Manufacturing Processes,2018,33(15):1661-1666.
    [10]Qu N S,Zhang Q L,Fang X L,et al.Experimental Investigation on Electrochemical Grinding of Inconel 718[J].Procedia CIRP,2015,35:16-19.
    [11]李科研.电解磨削加工高铬合金实验研究[D].大连:大连理工大学,2017.
    [12]Fan K,Jin Z,Guo J,et al.Investigation on the surface layer formed during electrochemical modification of pure iron[J].Applied Surface Science,2019,466:466-471.
    [13]Levinger R,Malkin S.Electrochemical grinding of WC-Co cemented carbides[J].Journal of Engineering for Industry-Transactions of the ASME,1979,101(3):285-294.
    [14]Zhang C,Zhang Y,Chen X,et al.Investigation of the electrochemical dissolution behavior of tungsten during electrochemical machining[J].The International Journal of Advanced Manufacturing Technology,2018,97(9-12):3575-3582.
    [15]Deng H,Huang R,Liu K,et al.Abrasive-free polishing of tungsten alloy using electrochemical etching[J].E-lectrochemistry Communications,2017,82:80-84.
    [16]Choi S H,Ryu S H,Choi D K,et al.Fabrication of WC micro-shaft by using electrochemical etching[J].The International Journal of Advanced Manufacturing Technology,2006,31(7/8):682-687.

© 2004-2018 中国地质图书馆版权所有 京ICP备05064691号 京公网安备11010802017129号

地址:北京市海淀区学院路29号 邮编:100083

电话:办公室:(+86 10)66554848;文献借阅、咨询服务、科技查新:66554700