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氧化铟锡薄膜电极的表面修饰
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  • 英文篇名:Surface Modification of Indium Tin Oxide Film Electrodes
  • 作者:孙磊 ; 晏菲 ; 周璘 ; 苏彬
  • 英文作者:SUN Lei;YAN Fei;ZHOU Lin;SU Bin;Institute of Analytical Chemistry,Department of Chemistry,Zhejiang University;
  • 关键词:ITO电极 ; 表面修饰 ; 化学吸附 ; 硅烷化 ; 电接枝
  • 英文关键词:ITO electrode;;surface modification;;chemical adsorption;;silanization;;electrochemical grafting
  • 中文刊名:TEST
  • 英文刊名:Journal of Instrumental Analysis
  • 机构:浙江大学化学系分析化学研究所;
  • 出版日期:2018-10-25
  • 出版单位:分析测试学报
  • 年:2018
  • 期:v.37
  • 基金:国家自然科学基金(21335001,21575126);; 浙江省自然科学基金(LZ18B050001)
  • 语种:中文;
  • 页:TEST201810010
  • 页数:10
  • CN:10
  • ISSN:44-1318/TH
  • 分类号:93-102
摘要
氧化铟锡(ITO)薄膜电极具有良好的物理(导电性高、透光性好)和化学性能,对其表面进行修饰可进一步拓展其在电分析化学中的应用。该文根据目前的研究现状,简要介绍了ITO薄膜电极的制备和清洗方法,总结了ITO薄膜电极的表面修饰方法,着重介绍了应用较多的化学吸附、硅烷化、电化学接枝3类方法,并简要评述了ITO薄膜电极表面修饰方法面临的挑战及应用前景。
        Indium tin oxide( ITO) thin-film electrodes have good physical( high conductivity and good light transmission) and chemical properties. Proper surface modification could further extend their applications in electroanalytical chemistry. Based on the present research status,the preparation and cleaning processes of ITO electrodes are briefly introduced in this paper,and the different modification methods are summarized,in which three of the most frequently employed methods,i. e.chemical adsorption,silanization and electrochemical grafting are emphatically introduced. Finally,the challenges and future application prospects in the surface modification of ITO thin film electrode are briefly discussed.
引文
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