摘要
采用射频磁控溅射法在[001]取向的掺铌钛酸锶(Nb:STO)单晶衬底上制备Na_(0.5)Y_(0.5)TiO_3(NYT)铁电薄膜,研究了该铁电薄膜的物相组成、显微结构、铁电性能、电输运性能。结果表明:NYT薄膜具有[001]取向的外延结构,其表面平整,界面清晰,结晶质量良好;NYT薄膜具有铁电性能,其剩余极化强度为0.3μC·cm~(-2),矫顽场为178kV·cm~(-1);NYT薄膜/电极界面存在肖特基势垒,反偏状态的肖特基结能够显著降低NYT薄膜的漏电流密度,提高其耐压强度,肖特基结处于正偏状态时的电流传导符合陷阱态控制的空间电荷限制电流机制。
Na_(0.5)Y_(0.5)TiO_3(NYT) ferroelectric thin film was prepared on the substrate of single-crystal niobium doped strontium titanate(Nb:STO)with[001]orientation by radio frequency magnetron sputtering.The phase composition,microstructure,ferroelectric properties and electrical transport properties of the ferroelectric thin film were studied.The results show that the NYT thin film had a[001] oriented epitaxial structure,the surface was smooth,the interface was clear,and the crystalline quality was good.The NYT thin film had ferroelectric properties with remanent polarization of 0.3μC·cm~(-2) and coercive field of 178 kV·cm~(-1).The Schottky barrier was found at the NYT thin film/electrode interface.The reverse-biased Schottky junction decreased the leakage current density significantly and increased the breakdown electric field strength of NYT thin film.The current conduction in the forward-biased state of Schottky junction complied with the space charge limited current mechanism controlled by trapping state.
引文
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