金属/介质亚波长结构的超分辨特性研究
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摘要
当微细加工技术应需而从微米尺寸迈向纳米尺寸时,在纳米尺度上,材料和结构展现出了新颖的宏观领域无法比拟的特性,打破了许多研究领域的传统限制,迅速激起人们对在纳米尺度控制物质的光电结构及其与光场相互作用的研究热潮。光学与纳米技术的碰撞一时之间将纳光子学推至研究的前沿,而表面等离子体光子学(Plasmonics)也从纳光子学研究领域脱颖而出。由于光学衍射极限的存在,传统光刻分辨率一般限制在半个波长。主要因为传统透镜只能捕获来自光源或物体的传播波,或者说研究限于远场,然而携带有物体更细节信息的表面消逝波(evanescent wave)却无法被获得。而自从由负折射率的超材料构成的超透镜(Superlens)被提出后,基于表面等离子体的亚波长结构可同时捕获传播波和表面消逝波,实现了近场的信息提取,获得了超衍射极限的成像。由于表面等离子激元是一种近场表面波且具有超衍射极限的光学特性,因而基于表面等离子体的纳米光刻技术理论上分辨率可以无限小,有望实现光子学、电子学元件在纳米尺度上的完美结合,集成于同一芯片上,从而使其成为下一代纳米制造技术的强有力的备选者之一。然而目前基于表面等离子体激元的纳米光刻技术尚存在纳米光斑对称性差、工作距离难以控制、加工效率低下等问题,难以达到芯片生产所要求的技术和装备标准。
为了克服或解决以上技术难点,本研究对表面等离子体激元超聚焦亚波长结构进行了设计,主要做的研究内容有：
首先,设计出一种基于银膜的同心圆环结构的表面等离子体透镜,利用FDTD严格数值计算方法,分析该透镜各个参数对聚焦特性的影响。
其次,为克服线性偏振光入射情况下聚焦光斑椭圆化问题,提出采用径向偏振入射光,获得圆对称的聚焦光斑,并且发现了近场Talbot效应。而且该效应只发生在入射波长小于透镜周期一半时。
再者,为了考察不同偏振光对聚焦特性的影响,又进一步模拟了相似的铝膜结构在线性偏振光照明下的聚焦特性,同样发现了Talbot效应。利用聚焦离子束技术(FIB)在铝膜上制作了表面等离子体透镜,并借助近场扫描显微镜(NSOM)测试得到了其近场光场分布,进而从理论和实验两方面验证了线性偏振光下的表面等离子体纳米透镜的Talbot效应。
随后,为进一步提高光刻分辨率,对浸入式表面等离子纳米透镜的聚焦特性进行了研究,对浸入介质为H2O、SiO2和Al2O3等情况进行了具体分析。还对铝、金纳米透镜聚焦效果与入射波长的相关性进行了深入的分析研究,获得了突破衍射极限的圆形纳米焦斑。焦斑尺寸仅为入射波长的四分之一,即较传统分辨率限制来说,理论上分辨率提高了一倍。研究结果不仅给后续研究提供了参考,还对纳米光刻、超分辨成像及数据存储等潜在应用领域具有一定的影响。
The ever-increasing demand for faster information transport and processingcapabilities has driven enormous progress in the microfabrication technology. Wehave witnessed a contiuous progression towards smaller, faster, and more efficientelectronic devices. The scaling of these devices has also brought about a myriad ofchallenges associated with electronic interconnection. On the other hand, a candidatetechnology has recently emerged and has been termed plasmoncis‘. As we know,due to the diffraction limit, the resolving power of traditional lithography waslimited at half of wavelength. However, for plasmonic nanolithography based onmetal-dielectric subwavelength structure, surface plasmon polaritons (SPPs) as aspecial type of light wave would be excitated and propagate along themetal-dielectric interface. Even the novel optical properties show that plasmonicnanostructure could break the diffraction limit. It means that the resolving power ofplasmonic nanolithography can be infinitesimal theoretically. Thereby mergingphotonics and electronic at nanoscale dimensions can be attained by integratingplasmonic, electric, and conventional photonic devices on the same chip, whichshould facilitate manufacture. Unfortunately, plasmonic nanolithography technologypresents some challenges, such as focal spot being not perfectly symmetrical, spacebetween the direct write array and wafer stage hardly being controled at nanometeraccuracy, and low efficiency in the production process.
For these problems, we are interesting to propose a metallic subwavelength structure, which was called plasmonic nanolens. In the beginning, the influence ofstructural parameters on focusing properties was analysed by using finite differencetime domain (FDTD).
Generally, an elliptical focal spot is obtained under linear ploarized light, toovercome this problem, the radially polarized light was used in our FDTD numericalsimulation for obtaining circular focal spot, and the Talbot effect of plasmonicnanolens was discovered. Then it is found that the Talbot effect can be observed onconditon that the incident wavelength is smaller than half of the period of thenanolens.
Subsequently, an Al nanolens was fabricated by focused ion beam (FIB)technology, and by near-field scanning optical microscopy (NSOM) the plasmonicTalbot effect was proved iulluminating by linearly polarized light.
Finally, to improve the resolving power, we considered an immersion plasmonicstructure. The focusing properties of nanolens being immersed in H2O, SiO2, andAl2O3were studied. Moreover, the influence of metal material and incidentwavelength on super focusing properties was researched. And a circular focal spotwith diameter of a quarter of incident wavelength was obtained, which break throughdiffraction limit.The super resolution properties of plasmonic nanolens could beexpected to apply in various fields including nanolithgraphy, near field microscopy,sensing, and data storage.
为了克服或解决以上技术难点,本研究对表面等离子体激元超聚焦亚波长结构进行了设计,主要做的研究内容有：
首先,设计出一种基于银膜的同心圆环结构的表面等离子体透镜,利用FDTD严格数值计算方法,分析该透镜各个参数对聚焦特性的影响。
其次,为克服线性偏振光入射情况下聚焦光斑椭圆化问题,提出采用径向偏振入射光,获得圆对称的聚焦光斑,并且发现了近场Talbot效应。而且该效应只发生在入射波长小于透镜周期一半时。
再者,为了考察不同偏振光对聚焦特性的影响,又进一步模拟了相似的铝膜结构在线性偏振光照明下的聚焦特性,同样发现了Talbot效应。利用聚焦离子束技术(FIB)在铝膜上制作了表面等离子体透镜,并借助近场扫描显微镜(NSOM)测试得到了其近场光场分布,进而从理论和实验两方面验证了线性偏振光下的表面等离子体纳米透镜的Talbot效应。
随后,为进一步提高光刻分辨率,对浸入式表面等离子纳米透镜的聚焦特性进行了研究,对浸入介质为H2O、SiO2和Al2O3等情况进行了具体分析。还对铝、金纳米透镜聚焦效果与入射波长的相关性进行了深入的分析研究,获得了突破衍射极限的圆形纳米焦斑。焦斑尺寸仅为入射波长的四分之一,即较传统分辨率限制来说,理论上分辨率提高了一倍。研究结果不仅给后续研究提供了参考,还对纳米光刻、超分辨成像及数据存储等潜在应用领域具有一定的影响。
The ever-increasing demand for faster information transport and processingcapabilities has driven enormous progress in the microfabrication technology. Wehave witnessed a contiuous progression towards smaller, faster, and more efficientelectronic devices. The scaling of these devices has also brought about a myriad ofchallenges associated with electronic interconnection. On the other hand, a candidatetechnology has recently emerged and has been termed plasmoncis‘. As we know,due to the diffraction limit, the resolving power of traditional lithography waslimited at half of wavelength. However, for plasmonic nanolithography based onmetal-dielectric subwavelength structure, surface plasmon polaritons (SPPs) as aspecial type of light wave would be excitated and propagate along themetal-dielectric interface. Even the novel optical properties show that plasmonicnanostructure could break the diffraction limit. It means that the resolving power ofplasmonic nanolithography can be infinitesimal theoretically. Thereby mergingphotonics and electronic at nanoscale dimensions can be attained by integratingplasmonic, electric, and conventional photonic devices on the same chip, whichshould facilitate manufacture. Unfortunately, plasmonic nanolithography technologypresents some challenges, such as focal spot being not perfectly symmetrical, spacebetween the direct write array and wafer stage hardly being controled at nanometeraccuracy, and low efficiency in the production process.
For these problems, we are interesting to propose a metallic subwavelength structure, which was called plasmonic nanolens. In the beginning, the influence ofstructural parameters on focusing properties was analysed by using finite differencetime domain (FDTD).
Generally, an elliptical focal spot is obtained under linear ploarized light, toovercome this problem, the radially polarized light was used in our FDTD numericalsimulation for obtaining circular focal spot, and the Talbot effect of plasmonicnanolens was discovered. Then it is found that the Talbot effect can be observed onconditon that the incident wavelength is smaller than half of the period of thenanolens.
Subsequently, an Al nanolens was fabricated by focused ion beam (FIB)technology, and by near-field scanning optical microscopy (NSOM) the plasmonicTalbot effect was proved iulluminating by linearly polarized light.
Finally, to improve the resolving power, we considered an immersion plasmonicstructure. The focusing properties of nanolens being immersed in H2O, SiO2, andAl2O3were studied. Moreover, the influence of metal material and incidentwavelength on super focusing properties was researched. And a circular focal spotwith diameter of a quarter of incident wavelength was obtained, which break throughdiffraction limit.The super resolution properties of plasmonic nanolens could beexpected to apply in various fields including nanolithgraphy, near field microscopy,sensing, and data storage.
引文
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