用户名: 密码: 验证码:
点衍射干涉仪检测技术研究
详细信息    本馆镜像全文|  推荐本文 |  |   获取CNKI官网全文
摘要
高精密仪器与设备的发展进步,对我国未来科学技术的发展具有重要意义,而精密光学元件的加工,往往是生产此类仪器与设备的核心技术。随着高精密仪器与设备的快速发展,光学元件面形误差的要求也越来越严苛。传统的面形检测设备,如迈克尔逊干涉仪、斐索球面干涉仪,其参考波面由参考元件反射形成,检测精度必然受制于参考元件的面形精度,很难满足超高精度面形检测的要求。
     本文研究的点衍射干涉仪检测技术,结构简单,采用针孔衍射产生参考波,从而摆脱了参考元件面形对检测精度的限制,极大地减少了系统误差,是超高精度检测新的发展方向。本论文的主要工作任务是研究点衍射干涉仪检测技术的关键理论与技术问题,进一步发展应用于面形测量的点衍射干涉检测技术。论文的研究工作包括以下几个部分:
     (1).充分调研了现在高精度面形检测的技术手段和点衍射干涉仪检测技术的国内外研究现状,回顾了点衍射干涉仪在面形检测中的发展历史。深入研究了其基本原理,在此基础上讨论了基于针孔衍射的点衍射干涉检测技术的实验方案和工作过程,并对其中所涉及的关键问题和技术难点进行了分析,对其在高精度面形检测中的发展趋势和应用前景进行了探讨。
     (2).针孔衍射波面与理想球面波的偏差是决定点衍射干涉仪检测精度的关键因素。对以往的针孔衍射波面计算方法进行了调研,分析与比较。利用有限元方法计算近场分布,再利用瑞利-索莫菲标量积分计算远场发散的方法,仿真分析与讨论了不同针孔直径、膜层厚度及系统误差引入后对衍射波面的影响。
     (3).详细介绍了点衍射干涉仪测量面形的原理,对测量中使用的移相干涉术进行了相应研究,数值仿真了干涉条纹的处理过程。分析了点衍射干涉仪中主要的误差来源和分类,及其对测量结果的影响。对点衍射干涉仪能够达到的理论精度进行了理论分析。
     (4).系统误差的标定是评价检测设备精度的重要手段。提出了一种新的结构实现点衍射干涉仪的“零位”测量,标定其系统误差,与传统方法相比,降低了装调难度。提出了一种CCD记录的实时图像处理计算机辅助装调的方法,设计出新的衍射模板,利用定位孔帮助聚焦斑与针孔的快速对准。提出了一种利用干涉图像中的背景光强,提取需要的位置信息,有效去除检测结果中几何误差的方法。搭建了实验平台,进行了实验验证。对标定系统所包含的系统误差进行了分析,对减少这些误差因素的方法以及检测结果和点衍射干涉仪检测精度的关系进行了探讨。
     (5).搭建了点衍射干涉仪检测实验系统,对一曲率半径250mm,口径25mm的凹球面反射镜进行了测量,将其结果与ZYGO干涉仪的测量结果进行了比较分析。对实验系统主要的误差源进行了分析,讨论了提高测量精度的方法。
     点衍射干涉仪原理结构简单,摆脱了参考元件的限制,在超高精度面形检测中拥有显著的技术优势。论文的这些研究成果为点衍射干涉仪的工程实现提供了理论和实验基础。
The development of the ultra precision instrument is very important in the futurescience and technology and the key to manufacture this kind of instrument is how tomanufacture the optic which is “good” enough. However, the accuracy of the traditionaloptical shop testing technology, such as Michelson inteferometry and Fizeauinterferometry, is limited by the reference wave which is produced by the reflection ofthe reference surface. The point diffraction interferometry (PDI) introduced in thisthesis not only has simple system configuration but also produces the reference wave bypinhole diffraction, so it can reach higher precision and accuracy. This thesis that isdevoted to basic research and the development of the key technology and problems ofthe point diffraction interferometry, is organized into five sections:
     (1) The domestic and overseas development status about the optical testingtechnology achieving high accuracy and precision is adequately investigated andthe history of the point diffraction is also reviewed. Based on the principle of thePDI, the experimental system, working process and the application protencial arediscussed. The involved key problems and technical difficulties are analyzed.
     (2) The deviation between the pinhole diffracted wave and the perfect sphericalwave is the keypoint of the accuracy of the PDI. The methods of calculating thepinhole diffracted wave are investigated and analyzed. A new way, based on FiniteElement Method (FEM) and Rayleigh-Sommerfeld scalar theory, is proposed toestimated the deviation and the influence of the system error on the diffracted waveis also numerical stimulated.
     (3) The system configuration of the PDI that be used to test spherical figure andthe phase shift interfermetry are discussed. The the interferogram processing isnumerical simulated. The main errors of the PDI and the theory accuracy that thePDI can reach are analyzed.
     (4) Calibration of the system errors is indispensable to estimate the accuracy of themeasurement devices. A new configuration, which is easier to make the alignment,of the null test method is proposed and set up. A method to align the focus spot ontothe pinhole with the help of two windows and a new way to calculate the relative position between the detector and the diffraction mask by processing theinformation on the intergram are proposed. The origin of the system errors and themethods to reduce those errors are analyzed. The relationship between the null testresult and the accuracy of the PDI is discussed.
     (5) A PDI experiment system is set up and a convace mirror which has thediameter of25mm and the radius of250mm is tested. The testing result is comparedwith another result tested by ZYGO interferometer. The main system errors areanalyzed.
     The PDI, which has got rid of the limitation of the reference surface, is prior toother measurement instruments in ultra precision figure testing. The research in thisthesis will be the theory and experiment foundation of the application of the PDI.
引文
[1]姚汉民,胡松,邢廷文.光学投影曝光微纳加工技术.北京:北京工业大学出版社,2006,1-18
    [2] Eric Hendrickx,Philippe Monnoyer,Lieve Van Look,.et al. Optical extensions towards the45-nm node, SPIE,2004,5377,357-368
    [3] Bruce W. Smith, Yongfa Fan, Michael Slocum,et al.25nm immersion lithography at193nm wavelength, SPIE,2005,5754,141-147
    [4] Kevin Monahan; Brian Trafas, Design and process limited yield at the65-nm node andbeyond, SPIE,2005,5756,230-239
    [5] Bob Streefkerk, Jan Baselmans, Wendy Gehoel-van Ansem,.et al., Extending opticallithography with immersion, SPIE,2004,5377,285-305
    [6] Hans Meiling, Vadim Banine, Noreen Harned, et al., Development of the ASML EUV alphademo tool, SPIE,2005,5751,90-101
    [7] Tomoyuki Matsuyama; Yasuhiro Ohmura; David M. Williamson, The lithographic lens: itshistory and evolution, SPIE,2006,6154,615403
    [8]波恩,沃耳夫,光学原理(杨葭荪译),第七版[M].北京:电子工业出版社,2009,438
    [9] Sugisaki Katsumi, Zhu Yucong. Present Status of the ASET At-wavelength Phase-shiftingPoint Diffraction Interferometer [C]. SPIE,2000,4146,47-53
    [10] Katsuhiko Murakami, Tetsuya Oshino, Hiroyuki Kondo, Development of optics for EUVlithography tools, SPIE,2007,6517,65170J
    [11] Patrick P. Naulleau, James A. Liddle, Farhad Salmassi, et al. Design and fabrication ofadvanced EUV diffractive elements, SPIE,2003, Vol.5347,9-17
    [12] Masahito Niibe, Atsushi Miyafuji, Hiroo Kinoshita, et al, Fabrication on of an asphericalmirror for extreme-ultraviolet lithography (EUVL) optics, SPIE,1998,3447,32-39
    [13] P.Hariharan, Optical Interferometry,2nd ed, San Diego:Academic Press,2003,121-122
    [14] Linfoot E. H., Recent Advances in Optics, Dover: Oxford University Press,,1955, Chap. II.
    [15] Yatagai T, Fringe Scanning Ronchi Test forAspherical Surfaces, Appl. Opt.,1984,23,3676-3679
    [16] Mejīa-Barbosa Y., Hartmann Test of Small F/#Convex Mirrors, Opt. Commun.,2006,263,17–24
    [17] Howes W. L., Lens Collimation and Testing Using a Twyman–Green Interferometer with aSelf-Pumped Phase-Conjugation Mirror, Appl. Opt.,1986,25,473
    [18] KocherD.G., Twyman–Green Interferometer to Test LargeApertureOptical Systems, Appl.Opt,1972, Vol.11,1872-1873
    [19] Daniel Malacara. Optical Shop Testing [M]_3rd ed. Hoboken: John Wiley&Sons, Inc,2007
    [20]石顺祥,张海兴,刘劲松.物理光学与几何光学,西安:西安电子科技大学出版社,2000,83
    [21] Burge J. H., Fizeau Interferometry for Large Convex Surfaces, SPIE,1995,2536,127-138
    [22] www.zygo.com
    [23] Deck L., D. Stephenson, M. Küchel, and C. Evans, Advances in Laser Fizeau Inteferometryfor Optical Testing, TOPS,2000,76,108–111
    [24] W. Linnik, A simple interferometer to test optical systems, Proc. Acad. Sci. USSR.1933,1,210-212
    [25] R.N. Smartt, W.H. Steel,“Theory and application of point-diffraction interferometers,” Jpn.J. Appl. Phys.1975,14,351-356
    [26] H.Medecki, E.Tejnil, K.A.Goldberg, J.bokor. Phase-shifting point diffractioninterferometer[J]. Opt. Lett.1996,21(19),1526-1528
    [27] Qian Gong, Joseph M. Geary, Modeling point diffraction interferometers[J], Opt. Eng,1996,35(02),351-356
    [28] Kazuya Ota, Takahiro Yamamoto, Yusuke Fukuda., Aspherical mirror measurement using apoint diffraction interferometer[C],SPIE,2002,4688,690-694
    [29] Jeffrey L. Klingmann Gary E. Sommargren., Sub-nanometer interferometry and precisionturing for large optical fabrication, in Ultra Lightweight Space OpticsNapa, CA,1999
    [30] Chen Lingfeng, Nie Liang, Zhou Taogeng, Sha Dingguo. Research on the fiber pointdiffraction interferometer for spherical figure measurement[C], SPIE,2006,6357,63574J
    [31] Nie Liang, Mengmeng Hu, Baoyuan Liu, CunliDuan., fiber point-diffraction interferometerfor measuring spherical surface[C], SPIE,2010,7749,77490B
    [32] HagyongKihm, Seung-Woo Kim., Oblique fiber optic diffraction interferometer for testingspherical mirrors [J], Opt. Eng,2005,44(12),125601
    [33] Sang Hun Lee, Patrick Naulleau, Kenneth A. Goldberg,et al. Phase-shifting point-diffractioninterferometry at193nm[J]. Appl. Opt.,2000,39(31),5768-5772
    [34] Naulleau Patrick, Goldberg Kenneth A. Dual-domain Point Diffraction Interferometer [J].Appl. Opt.,1999,38(16),3523-3532.
    [35] G.E.Sommargren, S.W Phillion,et al.,100-Picometer interferometry for EUVL[C].SPIE,2002,4688,316-328
    [36] Katsura Otaki, Florian Bonneau, Yutaka Ichihara., Absolute measurement of a sphericalsurface using a point diffraction interferometer [C], SPIE,1999,3740,602-605
    [37] Kazuya Otaki, Takahiro Yamamoto, Yusuke Fukuda et al. Advanced point diffractioninterferometer for EUV aspherical mirrors[C]. SPIE,2001,4343,543-550
    [38] Kihm Hagyong, Kim Seung-Woo., oblique point source for intererometer design[C], SPIE,2003,5144,240-249
    [39] Nikolay B. Voznesensky; Kyeong-Hee Lee; Vladimir K. Kirillovsky., Principles ofhighest-precision optical parts estimation on the basis of a point-diffraction interferometer[C],SPIE,2004,5252,241-251
    [40]周万治,卢振武.点衍射全息干涉仪[J].光学学报,1986,6(12):1130-1135
    [41]刘国淦,张学军,王权陡等。光纤点衍射干涉仪的技术研究[J].光学精密工程,2001,9(2):142-145
    [42] Ling Feng Chen, YaqingRen, Jie Li., Flat surface measurements on fiber point diffractioninterferometer[J], Opt. Eng,2010,49(05),050503
    [43] Daodang Wang, Yongying Yang, Chen Chen, et al., Point diffraction interferometer withadjustable fringe contrast for testing spherical surfaces, Applied Optics,2011,50(16),2342-2348
    [44]张宇,金春水,马冬梅等,可见光移相点衍射干涉仪的测试误差分析,红外与激光工程,2012,41(5),1351-1356
    [45]张宇,金春水,马冬梅等,可见光移相点衍射干涉仪的空气扰动误差分析,红外与激光工程,2012,41(7),1899-1904
    [46]邢廷文,何国良,舒亮.193nm移相点衍射干涉仪的测量误差分析[J].光电工程,2009,36(2),67-72
    [47]马强,刘伟奇,李香波等,点衍射干涉仪中小孔衍射波面误差分析[J].光学学报,2008,28(12),2321-2324
    [48]卢增雄,金春水,张立超,王丽萍,极紫外三维小孔矢量衍射波面质量分析[J].光学学报,2010,30(10),2849-2854
    [49]王俐,饶长辉,饶学军.纳米级针孔矢量衍射波前误差分析[J].光学机密工程,2012,20(3),499-505
    [50]陈琛,杨甬英,王道档等,基于时域有限差分方法的点衍射波前误差分析[J],中国激光,2011,38(9),165-169
    [51] K. Otaki, Y. Zhua, M. Ishij et al. Rigorous wavefront analysis of the visible light pointdiffraction interferometer for EUVL[C]. SPIE,2004,5193:182-190
    [52] J.W.顾德门,傅立叶光学导论(詹达三,董经武,顾本源译),北京:科学出版社,1979,47-51
    [53] Wolf, E. and E. W. Marchand, Comparison of the Kirchhoff and the Rayleigh-Sommerfeldtheories of diffraction at an aperture[J], J.Opt. Soc. Am,1964,54(5),587-594
    [54]杨晶晶,黄铭,吴中元等.亚波长银粒子/孔的光谐振特性[J].光学学报,2009,29(5),1379-1383
    [55]曾夏辉,范滇元,周萍.亚波长锥形波导的电磁场分布及传输特性[J],光学学报,2009,29(6),1487-1492
    [56] C.J. Kim,“Polynomial fit of interferograms,” Appl. Opt.1982,21,4521–4525
    [57] Guang-ming Dai, Virendra N. Mahajan., Orthonormal polynomials in wavefront analysis:error analysis[J], Appl. Opt.,2008,47(19),3433-3445
    [58] J. Y. Wang, D. E. Silva., Wavefront interpretation with Zernike polynomials, Appl. Opt,1980,19,1510–1518
    [59] B. Qi, H. Chen, N. Dong, Wavefront fitting of interferograms with Zernike polynomials, Opt.Eng.2002,41,1565–1569
    [60] Seiji Takeuchi; Osamu Kakuchi; Kenji Yamazoe, et al., Visible light point-diffractioninterferometer for testing of EUVL optics [C], SPIE,2006,6151,61510E
    [61] K. Otaki, T. Yamamoto, Y. Fukuda, K. Ota, et al., Accuracy evaluation of the point diffractioninterferometer for extreme ultraviolet lithography aspheric mirror[J], J. Vac. Sci. Technol. B,2002,20(1),295-300
    [62] KA. Goldberg, E. Tejnil, J. Bokor. A3D numerical study of pinhole diffraction to predict theaccuracy of EUV point diffraction interferometry.[C]. Extreme Ultraviolet Lithography,Optical Society of America, Boston, U.S.,1996,133~137
    [63]卢增雄,金春水,马冬梅,张海涛.微小孔偏差对远场波前质量影响分析[J].光学学报,2011,31(8),0812002
    [64] Bruning J. H, Herriott D.R, et al. Digital wavefront measuring interferometer for testingoptical surfaces and lenses [J]. Appl. Opt.,1974,13(11):2693-2703
    [65] J.Schwider, R.Burow, K.E.Elssner,et al., Digital wave-front measuring interferometry: somesystematic error sources[J], Appl. Opt.1983,22(21),3421-3432
    [66] Katherine Creath, Error sources in phase-measuring interferometry[C], SPIE,1992,1720,428-435
    [67] J.Schmit, K.Creath, Extended averaging technique for derivation of error-compensatingalgorithms in phase-shifting interferometry[J], Appl. Opt.1995,34(19),3610-3619
    [68] J.V.Wingerden, H.J.Frankena, C.Smorenburg, Linear approximation for measurement errorsin phase shifting interferometry[J], Appl. Opt.1991,30(19),2718-2729
    [69] C.J. Morgan. Least-squares estimation in phase-measurement interferometry [J]. OpticalLetter.,1984,23(4),350-352
    [70] C.K. Hong, S.R. Ryu and H.C Lim. Least-Squares fitting of the phase map obtained inphase-shifting electronic speckles pattern interferometry [J]. Opt.Lett.,1995,20(8),931-933
    [71] Greivenkamp J. E., Generalized Data Reduction for Heterodyne Interferometry[J]. Opt.Eng.,1984,8,(5),822-827
    [72] Wyant J C,Creath K. Recent advances in interferometric optic testing [J]. Laser Focus,1985,21(11),118-132
    [73] de Groot P. Measurement of transparent plates with wavelength-tuned Phase-shiftinginterferometry [J]. Appl. Opt.,2000,39(16),2658-2663
    [74] Sang Hun Lee. Phase-Shifting point-diffraction interferometry at193nm [J]. Applied Optics,2000,39(31),5768-5772
    [75] T.A.Rhoadarmer, L.M.Klein, Design of a spatially phase shifted self-referencinginterferometer wave front sensor[C], SPIE,2006,6306,63060K
    [76] C.Dunsby, Y.Gu, P.M.W.French, Single-shot phase-stepped wide-field coherence-gatedimaging[J], Opt. Express,2003,11(2),105-115
    [77] J.E. Millerdand, N.J. Broek. Methods and apparatus for splitting, imaging and measuringwavefronts in interferometry [P].U.S.Patent630430,2001
    [78] J. E. Millerd, N. J. Brock and J.Hayes, et al., Pixilated phase-mask dynamic interferometer
    [C]. SPIE,2004,5531,304-314
    [79] Matt Novak, J.E.Millerd, Neal Broek,et al,Analysis of a micropolarizer array-basedSimultaneous phase-shifting interferometer [J]. Appl. Opt.,2005,4(32),6861-6868
    [80] J. M. Huntley.Noise-immune phase unwrapping algorithm[J].Appl.Opt.,1989,28(16),3268-3270
    [81]何勇,朱日宏,陈磊.基于区域生长理论的波面解包算法研究[J].光学技术,2006,32(4),594-597
    [82] J.L.Seligson,C.A.Callari,Stability of a lateral-shearing heterodyne twyman-greeninterferometer [J].Optical Eng,1984,23(353),59-61
    [83] C. P. Brophy, Effect of intensity error correlation on the computed phase of phase-shiftinterferometry [J], J. Opt. Soc. Am. A,1990,7(4),537-541
    [84] B.Edlén. The refractive index of air [J]. Metrologia,1966,2,71-80
    [85] G. Bonsch, E. Potulski. Measurement of the refractive index of air and comparison withmodified Edlén’s formulae [J]. Metrologia,1998,35,133-139
    [86] K. P. Birch, M. J. Downs. Correction to the updated Edlén equation for the refractive index ofair [J]. Metrologia,1993,30,7-14
    [87] E. P. Ciddor. Refractive index of air: new equation for the visible and near infrared [J]. Appl.Opt.,1996,35,1566-1573
    [88] C.J. Evans. Certification, self-calibration and uncertainty in testing optical flats [A]. SPIE,2010,7656.
    [89]陈华,高精度面形检测中环境因素扰动分析:[博士学位论文],北京:中国科学院研究生院,2011,1-9
    [90] de Groot P, Deck Leslie L. Deck. New algorithms and error analysis for sinusoidal phaseshifting interferometry [P]. Laurel Brook Road, Middlefield, CT06455,2008
    [91]张宇,金春水,马冬梅等,点衍射干涉仪波前参考源标定算法的研究[J],中国激光,2012,39(3),0308001
    [92] Patrick P. Naulleau, Kenneth A. Goldberg, Sang H. Lee, et al., Extreme-ultravioletphase-shifting point-diffraction interferometer a wave-front metrology tool with subangstromreference-wave accuracy[J], Appl Opt,1999,38(35),7252-7263
    [93] Toshiaki MATSUURA, Satoru OKAGAKI, Takaaki NAKAMURA,et al., MeasurementAccuracy in Phase-Shifting Point Diffraction Interferometer with Two Optical Fibers[J],Optical Review,2007,14(6),401-405
    [94] G.Schulz, J.Schwider. Precise Measurement of Planeness [J]. Appl. Opt.,1957,6(6),1077-1084
    [95] Patrick Naulleau, Kenneth Goldberg, Sang Lee, Chang Chang, et al. Characterization of theaccuracy of EUV phase-shifting point diffraction interferometry[C],SPIE,1998,3331,114~122
    [96] Kenneth A. Goldberg, EUV interferometer:[Doctor dissertation], Berkeley:University ofCalifornia,1997,118-119
    [97] K. A Goldberg, P. P Naulleau, In situ alignment for point diffractioninterferometer[P].U.S.Patent6118535,2000
    [98] KA Goldberg, P Naulleau, J Bokor, Fourier transform interferometer alignment method[J],Appl. Opt,2002,41(22),4477-4483
    [99]刘克李艳秋,移点衍射干涉仪的高精度对准[J],中国激光,2010,7,1845-1849
    [100]苏显渝,李继陶,信息光学,北京:科学出版社,1999,5-19
    [101] Rafael C. Gonzalez, Richard E. Woods,数字图像处理(阮秋琦,阮宇智等译),第二版,北京:电子工业出版社,2007,132-142
    1姚汉民,胡松,邢廷文.光学投影曝光微纳加工技术.北京:北京工业大学出版社,2006,1-18

© 2004-2018 中国地质图书馆版权所有 京ICP备05064691号 京公网安备11010802017129号

地址:北京市海淀区学院路29号 邮编:100083

电话:办公室:(+86 10)66554848;文献借阅、咨询服务、科技查新:66554700