光学面形绝对检测技术研究
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摘要
当今社会对光学检测水平要求越来越高，特别是在投影光刻曝光光学系统中，对面形RMS值的要求达到纳米甚至亚纳米。EUV光刻物镜对面形要求达到RMS0.2nm的级别，这对光学检测水平是一个极高的挑战。在光学检测中一个关键的技术是面形的绝对检测技术。常规菲索干涉仪和泰曼格林干涉仪的检测是相对于参考面的相对检测，而商用参考面面形一般只有λ/20PV（约6nmRMS）。而绝对检测方法是能够标定出参考面以及干涉仪系统误差的技术。球面面形的绝对检测技术主要有两球面绝对检测和随机球平均方法，而对于平面主要是三平板技术和它的延伸。本文以面形绝对检测为方向，提出了一种基于泽尼克多项式的旋转平移绝对检测技术，并且通过实验验证取得了RMS0.2nm-0.3nm的检测不确定度。针对旋转平移绝对检测技术、两球面绝对检测技术和菲索干涉仪的面形检测，本文进行了详细的检测不确定度分析；重点对旋转平移绝对检测技术的B类不确定度进行了详细的分析，包括各个引起不确定度的误差源和它们之间的相关性。对两球面绝对检测技术中的猫眼中心确定误差引起的测量不确定度进行了理论分析，得出了对于两球面绝对检测猫眼位置中心的确定是非常重要的一个因素的结论。
本文主要创新点有旋转平移绝对检测方法的建立与实现、对旋转平移绝对检测测量不确定度进行了详细的分析，并设计实验进行了充分的验证，同时对两球面绝对检测中的猫眼中心确定误差进行了理论的分析。下一步的工作内容包括进一步减小误差，降低不确定度；研究更加稳定直观的评价光学面形的一种方法，使得光学面形的评价更加直观有效。
Higher and higher level of optical testing is required with the rapid developmentof society, especially in the lithographic objective lens system. It requires the surfacefigure to nanometer RMS even sub-nanometer RMS. One of the key technologies isthe absolute surface figure testing method. The requirement of the surface in EUVlithography objective reaches0.2nm RMS, which is a great challenge for opticalmetrology. In the widely used Fizeau and Twyman-Green interferometers, thereshould be a reference surface acting as a standard in the testing. But the normalquality of the reference surface of commercial transmission flat or sphere is aboutλ/20PV (about6nm RMS).So the absolute calibration of the reference surface isalways necessary for sub-nanometer metrology. Several techniques have beendeveloped to obtain the absolute surface. Absolute testing methods for sphericalsurfaces are mainly focused on the two-sphere method and ball averaging method.For plano surfaces, three-flat method and its extensions are widely used. This articlepresents a novel calibration method: shift-rotation method using Zernikepolynomials. Uncertainty of the absolute testing method, including shift-rotationmethod, two-sphere method is analyzed. The uncertainty of shift-rotation method isanalyzed detailed; the main uncertainty source of two-sphere method: the centerdetermination of the cat s-eye position is analyzed theoretically. Next step of work isto decrease the uncertainty of the shift-rotation method and study a new stable andintuitionistic evaluation method of the surface figure.
本文主要创新点有旋转平移绝对检测方法的建立与实现、对旋转平移绝对检测测量不确定度进行了详细的分析，并设计实验进行了充分的验证，同时对两球面绝对检测中的猫眼中心确定误差进行了理论的分析。下一步的工作内容包括进一步减小误差，降低不确定度；研究更加稳定直观的评价光学面形的一种方法，使得光学面形的评价更加直观有效。
Higher and higher level of optical testing is required with the rapid developmentof society, especially in the lithographic objective lens system. It requires the surfacefigure to nanometer RMS even sub-nanometer RMS. One of the key technologies isthe absolute surface figure testing method. The requirement of the surface in EUVlithography objective reaches0.2nm RMS, which is a great challenge for opticalmetrology. In the widely used Fizeau and Twyman-Green interferometers, thereshould be a reference surface acting as a standard in the testing. But the normalquality of the reference surface of commercial transmission flat or sphere is aboutλ/20PV (about6nm RMS).So the absolute calibration of the reference surface isalways necessary for sub-nanometer metrology. Several techniques have beendeveloped to obtain the absolute surface. Absolute testing methods for sphericalsurfaces are mainly focused on the two-sphere method and ball averaging method.For plano surfaces, three-flat method and its extensions are widely used. This articlepresents a novel calibration method: shift-rotation method using Zernikepolynomials. Uncertainty of the absolute testing method, including shift-rotationmethod, two-sphere method is analyzed. The uncertainty of shift-rotation method isanalyzed detailed; the main uncertainty source of two-sphere method: the centerdetermination of the cat s-eye position is analyzed theoretically. Next step of work isto decrease the uncertainty of the shift-rotation method and study a new stable andintuitionistic evaluation method of the surface figure.
引文
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