同步辐射单色器晶体面形控制技术研究
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摘要
由于波荡器的引入,电子能量的提高和电子束团发散度的极度减小,第三代同步辐射光源所产生的辐射功率和功率密度比第二代光源提高两个数量级,高热负载将导致光束线各挡光元件性能降低甚至失效。单色器作为同步辐射装置最主要器件,对X射线起单色化的作用,它的分光元件的分光结果决定着实验站的最终成败。而分光元件对高热负载极其敏感,较低的功率密度都将引起非常大的分光元件形变。本论文以单色器的分光元件—衍射晶体面形变为主轴,着重做了以下几方面的工作:
1.单色器晶体的面形变是单色器设计的最主要指标之一,系统研究和分析使晶体面形变的各种因素,以便采取对应的措施或应用不同的方法保证晶体面形变达到最小。这些因素包括由热负载引起的整体弯曲、局部凸起和晶格常数变化三种形变,工作环境如直接冷却流体在晶体内部产生压力和高真空环境形成负压而导致的晶面形变,机械加工的残余应力与装配夹持力引起的晶体面形变等。
2.衍射晶体面产生形变,必然导致单色器摇摆曲线变宽,性能降低,甚至失效,主要研究了晶体面形变对晶体的能量分辨率、传输效率、衍射效率和束线光斑弥散的影响问题。
3.减少晶体面的热吸收和采取防止衍射面变形能够提高晶体分光性能。选择合适的结构方式和制冷媒体;在高热负载下,优化衍射晶体的结构参数;利用化学机械抛光法释放晶体加工过程中的残余应力;采用以补偿为主要方式的预变形装配和冷却压弯技术;采用零变形装夹技术等方式都能够有效减小由于热负载产生的晶体面形变。
4.第三代同步辐射在国内初次研制,高热负载前所未有,结合上海光源弧矢聚焦双晶单色器的研制,完成了当前具有先进性的第一水冷晶体系统的分析和设计。该系统通过结构参数优化分析,采用了扩散焊接工艺的异形晶体结构形式,在考虑冷却效率的同时,兼顾了冷却晶体的安装,克服了晶体的密封与晶体面形变问题。单色器在线测试结果显示,摇摆曲线较为理想。
Power and power density produced by the third generation synchrotron radiation facility light source, improve two number-lever than that of the second generation synchrotron radiation facility light source due to utility of dulator,upgrading of electronic energy and degrading of electronic group scatering.High heat load resuts in preventing components performance degrading or invalid.Monochromator separates X-rays as one of central components of synchrotron radiation facility. Monochromatic component is sensitive for high heat load and lower power density resuts in great distortion of component. The focuses of the thesis with the surface distortions of the monochromator diffraction crystal which is Monochromatic component of monochromator as principal axis, are as follows:
(1) The surface distortions of the monochromator diffraction crystal is one of monochromator design targets,and in order to taking measurements to maintain the slope error of crystal minnium,all kinds of factors resulting in the slope error of crystal surface are studied and analysed.The factors includes that three different kinds of distortions with general bowing,thermal bump and the change in the spacing between the crytak planes,occur in the crystal due to the high heat load, that the distortions is due to directly cooling water pressure and negative pressure of high vacuum surroundings, and that the distortions is due to mechanical fabrication and assembly hold stress et.al.
(2) The surface distortions of the monochromator diffraction crystal results in rocking curve of the monochromator broadening width,performance debase,and extremely invalidation.Eergy differentiation,ransfer and diffraction efficiency,and beamline facula dispersion are studied and analysed.
(3) Removing heat absorbing on crystal surface and preventing crystal distortion can improve diffraction performance.Choosing appropriate structure and cooling media,optimizing structure parameter of crystal in high heat load,releasing machining stress by CMP,taking beforehand distortion assembly,and cooling with bending et.al remove crystal surface distortions of the monochromator due to heat load.
(4) The third generation synchrotron radiation facility is first developed with excessively high heat load. We design and analyse the first advanced water-cooling crystal system with develping SSRF sagitally focusing double-crystal monochromator .The diffraction crystal of two part are assembled by diffusion bonded,which solves the problem of airproof and distortion of crystal surface.The testing result on lines shows that rocking curve is excellent.
1.单色器晶体的面形变是单色器设计的最主要指标之一,系统研究和分析使晶体面形变的各种因素,以便采取对应的措施或应用不同的方法保证晶体面形变达到最小。这些因素包括由热负载引起的整体弯曲、局部凸起和晶格常数变化三种形变,工作环境如直接冷却流体在晶体内部产生压力和高真空环境形成负压而导致的晶面形变,机械加工的残余应力与装配夹持力引起的晶体面形变等。
2.衍射晶体面产生形变,必然导致单色器摇摆曲线变宽,性能降低,甚至失效,主要研究了晶体面形变对晶体的能量分辨率、传输效率、衍射效率和束线光斑弥散的影响问题。
3.减少晶体面的热吸收和采取防止衍射面变形能够提高晶体分光性能。选择合适的结构方式和制冷媒体;在高热负载下,优化衍射晶体的结构参数;利用化学机械抛光法释放晶体加工过程中的残余应力;采用以补偿为主要方式的预变形装配和冷却压弯技术;采用零变形装夹技术等方式都能够有效减小由于热负载产生的晶体面形变。
4.第三代同步辐射在国内初次研制,高热负载前所未有,结合上海光源弧矢聚焦双晶单色器的研制,完成了当前具有先进性的第一水冷晶体系统的分析和设计。该系统通过结构参数优化分析,采用了扩散焊接工艺的异形晶体结构形式,在考虑冷却效率的同时,兼顾了冷却晶体的安装,克服了晶体的密封与晶体面形变问题。单色器在线测试结果显示,摇摆曲线较为理想。
Power and power density produced by the third generation synchrotron radiation facility light source, improve two number-lever than that of the second generation synchrotron radiation facility light source due to utility of dulator,upgrading of electronic energy and degrading of electronic group scatering.High heat load resuts in preventing components performance degrading or invalid.Monochromator separates X-rays as one of central components of synchrotron radiation facility. Monochromatic component is sensitive for high heat load and lower power density resuts in great distortion of component. The focuses of the thesis with the surface distortions of the monochromator diffraction crystal which is Monochromatic component of monochromator as principal axis, are as follows:
(1) The surface distortions of the monochromator diffraction crystal is one of monochromator design targets,and in order to taking measurements to maintain the slope error of crystal minnium,all kinds of factors resulting in the slope error of crystal surface are studied and analysed.The factors includes that three different kinds of distortions with general bowing,thermal bump and the change in the spacing between the crytak planes,occur in the crystal due to the high heat load, that the distortions is due to directly cooling water pressure and negative pressure of high vacuum surroundings, and that the distortions is due to mechanical fabrication and assembly hold stress et.al.
(2) The surface distortions of the monochromator diffraction crystal results in rocking curve of the monochromator broadening width,performance debase,and extremely invalidation.Eergy differentiation,ransfer and diffraction efficiency,and beamline facula dispersion are studied and analysed.
(3) Removing heat absorbing on crystal surface and preventing crystal distortion can improve diffraction performance.Choosing appropriate structure and cooling media,optimizing structure parameter of crystal in high heat load,releasing machining stress by CMP,taking beforehand distortion assembly,and cooling with bending et.al remove crystal surface distortions of the monochromator due to heat load.
(4) The third generation synchrotron radiation facility is first developed with excessively high heat load. We design and analyse the first advanced water-cooling crystal system with develping SSRF sagitally focusing double-crystal monochromator .The diffraction crystal of two part are assembled by diffusion bonded,which solves the problem of airproof and distortion of crystal surface.The testing result on lines shows that rocking curve is excellent.
引文
1 D.Shu.et.al.Beamline standard component designs for the Advanced Photon Source.Rev.Sci.Instrum.1995,66(2):1795-1797.
2 I.Polikarpov.et.al.The protein crystallography beamline at LNLS,the Brazilian National Synchrotron Light Source.Nucl.Instum.Methods.1998,A405(1):159-164.
3 F.Senf.et.al.Precision demanded of a Rowland circle monochromator:its realization.Rev.Sci.Instrum.1995,66(2):2154-2156.
4 V.Martynov.et al.Comparison of modal and differential methods for multilayer gratings.Nucl.Instum.Methods.1994,A339(1):617-625.
5 Michael Hart.X-ray monochromators for high-power synchrotron radiation sources.Nucl.Instum.Methods,1990,A297(1):306-311.
6 L.P.Dolbnya.et.al.Focusing parabolic pyrolytic graphite X-ray monochromator.Nucl.Instum.Methods,1995,A359(1):141-145.
7 徐朝银编著.同步辐射光学与工程.中国科学技术大学国家同步辐射实验室.
8 马礼敦,杨家福主编.同步辐射应用概论.复旦大学出版社.
9 Mihiro Yanagihara,Takumi Maehara et.ai.Performance of a wideband multilayer polarizer for soft x rays.Rev.Sci.Instrum.1992,63(1):1516-1518.
10 Snigirev A.The recent development of Bragg-Fresnel crystal optics.Experiments and applications at the ESRF,Rev.Sci.Instrum.1995,66(2):2053-2058.
11 G.Marot,M.Rossat.Liquid Nitrogen cooling of Silicon crystal monochromators:ESRF development.Proc SPIE,1992,Vol.1739:464-473.
12 S.Joksch,et.al.Heating effects of monochromator crystal at a high-intensity wiggler beam lLne.Nucl Instr Meth,1990,A291(1):325-331.
13 Yaming Li.Mechanical basis of X-ray optics optimal design.Chicago: Illinois,May 2005.
14 材料力学,王复兴,林祖森等著.华北工学院理学系.
15 张银霞.单晶硅片超精密磨削加工表面层损伤的研究.大连:大连理工大学,博士学位论文,2006.
16 Gogosti Y,etal.Raman microspetroscopy study of processing-induced phase transformation and residual stress in silicon.Semiconductor Science Technology,1999,14:936-944.
17 樊瑞新,卢焕明.线切割单晶硅表面损伤的研究.材料科学与工程,1999,17(2):55-57.
18 杨德仁,樊瑞新,姚鸿年.硅晶片切割损伤层微观应力的研究.材料科学与工程,1994,12(3):33-37.
19 Gordon C.Tajiri.Analysis and design of precision optical componants in high-intensity,third-generation on X-ray beamlines.Chicago:University of Illinois,May 1994.
20 G.S.KNAPP.et.al.High resolution monochromator systems using thermal gradient induced variable bragg spacing.Nucl.Instum.Methods.1986,A246(1):365-367.
21 Stefan Joksch.et.al.Heating effects of monochromator crystals at a high-intensity wiggler beam line.Nucl.Instum.Methods.1990,A291(1):325-331
22 G.VAN DER LAAN.et.al.A chromatic premirror system for a double-crystal monochromator.Nucl.Instum.Methods.1990,A291(1):225-227.
23 Tetsuya Ishikawa,Keiichi Hirano and Seishi Kikuta.Applications of dynamic x-ray diffraction to advanced synchrotron x-ray optics.Proc SPIE,1992,Vol.1740:72-80.
24 Steven L.et.al.A manually operated ultra-high-vacuum water-cooled slit mechanism for the u13u Wiggler/Undulator spectroscopy branch line at the national synchrotron light source.Nucl.Instum.Methods.1990,A291(1):348-349.
25 J.Susini,and M.Wulff.Proc SPIE,1977,Vol.1993:278-290.
26 C.S.Rogers,D.M.Mills,and W.-K.Lee,et.al.Performance of a liquid-nitrogen-holed,thin silicon crystal monocromator on a high-power,focused wiggler synchrotron beam.Rev.Sci.Instrum.1995,66(6):3494-3499
27 A.M.Khounsary,R.K.Smither,and S.Davey.Diamond Monochromator for High Heat Flux Synchrotron X-ray Beams.Proc SPIE,1992,Vol.1739:628-642.
28 Robert K.Smither.Summary of Workshop on High Heat Load x-ray Opics Held at Argonne National Laboratory.Nucl Instr Meth,1990,A291(1):286-299.
29 H.Yamaoka,etal.Experimental results from a water-cooled monochromator with micro-channels on esrf wiggler beamline.Nucl Instr Meth,1994,351:559-564.
30 K.Takeshita,etal.Finite element analysis of thermal distortion of directly water-cooled silicon crystal monocromator.Proc SPIE,1992,Vol.1739:528-531.
31 T.Oversluizen,etal.Performance of a directly water-cooled silicon crystal for use in high-power synchrotron radiation appliacations.Rev.Sci.Instrum.1989,60(7):1493-1500
32 L.E.Berman,et.al.Adaptive crystal optics for high-power synchrotron source.Nucl Instr Meth,1991,A302(1):558-562.
33 M.Hart.X-ray monochromators for high-power synchrotron radiation source.Nucl Instr Meth,1990,A297(1):306-311.
34 T.Tonnessen,et al.Cooled silicon crystal monochromator test results.Proc SPIE,1992,Vol.1739:622-627.
35 J.Hrdv.Rev.Sci.Instrum.1992,63:459-460.
36 王纳秀.同步辐射光束线热缓释技术研究及冷却技术的应用.北京:中国科学院研究生院,博士学位论文,2006.
37 T.Mochizuki,Y.Kohmura,et.al.Cryogenic cooling monochromator for the Spring-8 undualtor beamlines,Nucl Instr Meth.2001,A467: 647-649.
38 Kenji Tamasaku,Makina Yabashi,et al.Performance of cryogenically cooled monochromator at Spring-8.Proc SPIE,2002,Vol.4782:132-142.
39 王永宪,于化东,臧春雨,王东海.冰洲石晶体化学机械抛光(CMP)工艺参数研究.材料导报网刊,2007,3:31-32.
40 狄卫国,刘玉岭,司田华,ULSI硅衬底的化学机械抛光技术,半导体技术,2002.27(7):18-22.
41 韩荣久,孙恒德,徐德全.单晶硅片的低温抛光技术.光学精密工程,1998,6(5):104-109.
42 王明海,卢泽生.单晶硅超精密切削表面质量各向异性的研究.航空精密制造技术,2007,43(1):13-16.
43 Hiroyuki Oyanagi.Adaptive Silicon Monochromators for High Heat-Load Insertion Devices.Proc SPIE,1992,Vol.1740:34-43.
44 Lonny E.Berman,J.B.Hastings,et.al.An adaptive crystal bender for high power synchrotron radiation beams.Proc SPIE,1992,Vol.1739:489-501.
45 Malcolm R.Howells,et.al.Theory and practice of elliptically bent x-ray mirrors.Opt.Eng.,2000,39(10):2748-2762.
46 H.Yamaoka,Andreas K.Freund.Performance of a bender for a water cooled monochromator crystalat a high power wiggler beamline of the ESRF.Rev.Sci.Instrum.1995,66(2):2092-2094.
47 王纳秀,张映萁.液氮冷却单色仪晶体的热应变分析.核技术,2002,25(6):401-407.
48 温利,周仁魁,夏绍建.双晶单色器弧矢聚焦晶体面形有限元分析.光学技术,2003,29(3):313-315.
49 董晓浩,凤良杰,徐朝银.NSRL-U7C双晶单色器热载影响与计算分析.核技术,2006,29(1):6-10.
2 I.Polikarpov.et.al.The protein crystallography beamline at LNLS,the Brazilian National Synchrotron Light Source.Nucl.Instum.Methods.1998,A405(1):159-164.
3 F.Senf.et.al.Precision demanded of a Rowland circle monochromator:its realization.Rev.Sci.Instrum.1995,66(2):2154-2156.
4 V.Martynov.et al.Comparison of modal and differential methods for multilayer gratings.Nucl.Instum.Methods.1994,A339(1):617-625.
5 Michael Hart.X-ray monochromators for high-power synchrotron radiation sources.Nucl.Instum.Methods,1990,A297(1):306-311.
6 L.P.Dolbnya.et.al.Focusing parabolic pyrolytic graphite X-ray monochromator.Nucl.Instum.Methods,1995,A359(1):141-145.
7 徐朝银编著.同步辐射光学与工程.中国科学技术大学国家同步辐射实验室.
8 马礼敦,杨家福主编.同步辐射应用概论.复旦大学出版社.
9 Mihiro Yanagihara,Takumi Maehara et.ai.Performance of a wideband multilayer polarizer for soft x rays.Rev.Sci.Instrum.1992,63(1):1516-1518.
10 Snigirev A.The recent development of Bragg-Fresnel crystal optics.Experiments and applications at the ESRF,Rev.Sci.Instrum.1995,66(2):2053-2058.
11 G.Marot,M.Rossat.Liquid Nitrogen cooling of Silicon crystal monochromators:ESRF development.Proc SPIE,1992,Vol.1739:464-473.
12 S.Joksch,et.al.Heating effects of monochromator crystal at a high-intensity wiggler beam lLne.Nucl Instr Meth,1990,A291(1):325-331.
13 Yaming Li.Mechanical basis of X-ray optics optimal design.Chicago: Illinois,May 2005.
14 材料力学,王复兴,林祖森等著.华北工学院理学系.
15 张银霞.单晶硅片超精密磨削加工表面层损伤的研究.大连:大连理工大学,博士学位论文,2006.
16 Gogosti Y,etal.Raman microspetroscopy study of processing-induced phase transformation and residual stress in silicon.Semiconductor Science Technology,1999,14:936-944.
17 樊瑞新,卢焕明.线切割单晶硅表面损伤的研究.材料科学与工程,1999,17(2):55-57.
18 杨德仁,樊瑞新,姚鸿年.硅晶片切割损伤层微观应力的研究.材料科学与工程,1994,12(3):33-37.
19 Gordon C.Tajiri.Analysis and design of precision optical componants in high-intensity,third-generation on X-ray beamlines.Chicago:University of Illinois,May 1994.
20 G.S.KNAPP.et.al.High resolution monochromator systems using thermal gradient induced variable bragg spacing.Nucl.Instum.Methods.1986,A246(1):365-367.
21 Stefan Joksch.et.al.Heating effects of monochromator crystals at a high-intensity wiggler beam line.Nucl.Instum.Methods.1990,A291(1):325-331
22 G.VAN DER LAAN.et.al.A chromatic premirror system for a double-crystal monochromator.Nucl.Instum.Methods.1990,A291(1):225-227.
23 Tetsuya Ishikawa,Keiichi Hirano and Seishi Kikuta.Applications of dynamic x-ray diffraction to advanced synchrotron x-ray optics.Proc SPIE,1992,Vol.1740:72-80.
24 Steven L.et.al.A manually operated ultra-high-vacuum water-cooled slit mechanism for the u13u Wiggler/Undulator spectroscopy branch line at the national synchrotron light source.Nucl.Instum.Methods.1990,A291(1):348-349.
25 J.Susini,and M.Wulff.Proc SPIE,1977,Vol.1993:278-290.
26 C.S.Rogers,D.M.Mills,and W.-K.Lee,et.al.Performance of a liquid-nitrogen-holed,thin silicon crystal monocromator on a high-power,focused wiggler synchrotron beam.Rev.Sci.Instrum.1995,66(6):3494-3499
27 A.M.Khounsary,R.K.Smither,and S.Davey.Diamond Monochromator for High Heat Flux Synchrotron X-ray Beams.Proc SPIE,1992,Vol.1739:628-642.
28 Robert K.Smither.Summary of Workshop on High Heat Load x-ray Opics Held at Argonne National Laboratory.Nucl Instr Meth,1990,A291(1):286-299.
29 H.Yamaoka,etal.Experimental results from a water-cooled monochromator with micro-channels on esrf wiggler beamline.Nucl Instr Meth,1994,351:559-564.
30 K.Takeshita,etal.Finite element analysis of thermal distortion of directly water-cooled silicon crystal monocromator.Proc SPIE,1992,Vol.1739:528-531.
31 T.Oversluizen,etal.Performance of a directly water-cooled silicon crystal for use in high-power synchrotron radiation appliacations.Rev.Sci.Instrum.1989,60(7):1493-1500
32 L.E.Berman,et.al.Adaptive crystal optics for high-power synchrotron source.Nucl Instr Meth,1991,A302(1):558-562.
33 M.Hart.X-ray monochromators for high-power synchrotron radiation source.Nucl Instr Meth,1990,A297(1):306-311.
34 T.Tonnessen,et al.Cooled silicon crystal monochromator test results.Proc SPIE,1992,Vol.1739:622-627.
35 J.Hrdv.Rev.Sci.Instrum.1992,63:459-460.
36 王纳秀.同步辐射光束线热缓释技术研究及冷却技术的应用.北京:中国科学院研究生院,博士学位论文,2006.
37 T.Mochizuki,Y.Kohmura,et.al.Cryogenic cooling monochromator for the Spring-8 undualtor beamlines,Nucl Instr Meth.2001,A467: 647-649.
38 Kenji Tamasaku,Makina Yabashi,et al.Performance of cryogenically cooled monochromator at Spring-8.Proc SPIE,2002,Vol.4782:132-142.
39 王永宪,于化东,臧春雨,王东海.冰洲石晶体化学机械抛光(CMP)工艺参数研究.材料导报网刊,2007,3:31-32.
40 狄卫国,刘玉岭,司田华,ULSI硅衬底的化学机械抛光技术,半导体技术,2002.27(7):18-22.
41 韩荣久,孙恒德,徐德全.单晶硅片的低温抛光技术.光学精密工程,1998,6(5):104-109.
42 王明海,卢泽生.单晶硅超精密切削表面质量各向异性的研究.航空精密制造技术,2007,43(1):13-16.
43 Hiroyuki Oyanagi.Adaptive Silicon Monochromators for High Heat-Load Insertion Devices.Proc SPIE,1992,Vol.1740:34-43.
44 Lonny E.Berman,J.B.Hastings,et.al.An adaptive crystal bender for high power synchrotron radiation beams.Proc SPIE,1992,Vol.1739:489-501.
45 Malcolm R.Howells,et.al.Theory and practice of elliptically bent x-ray mirrors.Opt.Eng.,2000,39(10):2748-2762.
46 H.Yamaoka,Andreas K.Freund.Performance of a bender for a water cooled monochromator crystalat a high power wiggler beamline of the ESRF.Rev.Sci.Instrum.1995,66(2):2092-2094.
47 王纳秀,张映萁.液氮冷却单色仪晶体的热应变分析.核技术,2002,25(6):401-407.
48 温利,周仁魁,夏绍建.双晶单色器弧矢聚焦晶体面形有限元分析.光学技术,2003,29(3):313-315.
49 董晓浩,凤良杰,徐朝银.NSRL-U7C双晶单色器热载影响与计算分析.核技术,2006,29(1):6-10.