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(Ag)/Fe/Ag纳米薄膜的制备、微结构和磁特性研究
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摘要
探索和研究新型磁性材料的物性和微结构之间的关系一直以来都是磁学领域的研究热点。尤其是近年来,伴随着器件的小型化,磁性器件单元的尺度越来越小,因此纳米尺度受限体系的磁学性质的研究就显得尤为重要了。这些受限体系的磁组态往往表现出新颖的物理现象,因而受到国内外同行的广泛关注。本论文利用对靶磁控溅射法制备了一系列Ag/Fe/Ag,Fe/Ag铁磁金属纳米薄膜,并利用VSM、XRD和SPM等对材料的磁特性和微结构进行了研究。取得的主要研究结果如下:
     1.在室温下采用磁控溅射法制备了Ag(x nm) /Fe (35 nm) /Ag (x nm)系列薄膜,覆盖层和衬底层的厚度x = 1,2,3,4,和5 nm。对样品的微结构和磁特性进行了研究。我们发现衬底层和覆盖层厚度对于样品的微结构和磁性能影响很大。Ag层厚度为3纳米时矫顽力最大约为135 Oe,粗糙度最小约为0.7。同时XRD衍射图谱证明磁晶各向异性对样品矫顽力的影响不大,样品的形状各向异性起主要作用。
     2.在室温下采用磁控溅射法制备了Ag(3nm)/Fe(xnm)/Ag(3nm)薄膜样品。x=10,15,25,35和40 nm。发现Fe磁性层的厚度对样品的磁性能和微结构有很大的影响。磁性层厚度为35纳米时,样品垂直矫顽力较大约为135 Oe。且平均粒径和磁畴尺寸也比较小。
     3.采用对靶磁控溅射法制备的Ag(3 nm)/Fe(35 nm)/Ag(3 nm)纳米薄膜。随后进行30分钟的原位退火,发现退火温度对样品微结构和磁特性有重要影响。随退火温度的增加,矫顽力呈先稍微减小后增加的趋势。退火温度为500℃时,矫顽力达到最大,垂直矫顽力约为3.3 KOe,表面平均粗糙度约为1.2 nm,δM曲线表明此时颗粒间交换耦合作用较弱,静磁相互作用较强。
     4.采用直流对靶磁控溅射法在普通玻璃基片上制备了Fe(35nm)/Ag(3nm)薄膜,随后进行30 min原位退火。发现500℃原位退火时,样品的垂直膜面矫顽力最大约为522 Oe,不同的退火温度,对样品的微结构和磁特性影响很大
The research about the microstructure and magnetic properties of ferromagnetic metal films has attracted much attention in magnetism domain. This research has been of both technology and scientific interest. In present paper, nanogranular and ferromagnetic metal films were prepared by facing magnetron sputtering method. The magnetic properties and microstructure of these films have been investigated in detail by VSM, XRD and SPM.
     The main research results are summarized as follows:
     1. Ag(x nm) /Fe (35 nm) /Ag (x nm) (x = 1,2,3,4, 5 nm) films have been prepared using a dc facing magnetron sputtering method. The structure and magnetic properties of the films were researched. It has been found that the structure and magnetic properties of the films depend strongly on the Ag layer thickness. The coercivity of Ag(3 nm) /Fe (35 nm) /Ag (3 nm) film reaches about 135 Oe. The granulars becomes fine and the surface mean roughness of the films is 0.7nm. XRD suggested that the origin of large coercivity is grains shape anisotropy.
     2. Ag(3 nm)/Fe(x nm)/Ag(3 nm) films have been fabricated using a dc facing magnetron sputtering method. The results indicate that the structure and magnetic properties depend strongly on Fe layer thickness. The perpendicular coercivity of the film reaches about 135 Oe just at x =35 nm . AFM images and MFM images show the average grain size and average magnetic cluster size are small.
     3. Ag(3 nm)/Fe(35 nm)/Ag(3 nm) films were prepared by magnetron sputtering. The structure and magnetic properties depend strongly on the postannealing temperature. The coercivity values first decrease then increase as postannealing temperature increase. The coercivity value reaches the maximum at Ta=500℃. The perpendicular coercivity and the average roughness are obtained about 3.3 kOe and 1.2 nm. We analyzed theδM curves of Ag(3 nm)/Fe(35 nm)/Ag(3 nm) annealed at 500℃for 30 min. The shape of curve shows negative deviations, so we thick that the exchange interaction is mitigated,magnetostatic interactions is the major.
     4. Fe(35 nm)/Ag(3 nm) films were prepared by magnetron sputtering. It has been found that the high perpendicular coercivity is obtained in the film annealed at 500oC for30 min, and about 522 Oe . The structure and magnetic properties depend strongly on the postannealing temperature.
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