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Cu/Ni孪晶多层膜纳米划痕的分子动力学模拟
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摘要
实验方法无法直接观测纳米尺度刻划过程中材料内部的微结构演化规律,而计算机数值模拟方法可以从原子尺度对其进行分析。利用分子动力学方法对具有共格(连贯性)孪晶界面Cu/Ni多层膜的刻划过程进行模拟。在保持刻划速度90 m/s及刻划深度10 A条件下,研究共格孪晶界面Cu/Ni多层膜微结构塑性形变机理。仿真结果表明,部分孪晶界面会平行于原有孪晶界面移动,且划头划过之后的孪晶界面会吸收大量的堆垛层错。通过对不同厚度的孪晶样品进行纳米刻划模拟仿真,结果显示孪晶厚度越薄,样品所受平均摩擦力和平均摩擦系数越小。
It can not directly observe the evolution of microstructures in materials during nanoscale scratching by experiment,but computer numerical simulation can be used to analyze from atomic scale.The nanoscratching of the Cu/Ni multi-layer with coherent twin interfaces was simulated by molecular dynamics method.Under the scratching speed of 90 m/s and scratching depth of 10 A,the micros tructure plastic deformation mechanism of Cu/Ni multi-layer is studied.The simulation results show that some twin boundaries move in parallel with the original twin boundaries,and the twin boundaries after scratching will absorb a lot of stacking faults.The results also show that the average friction force and friction coefficient of specimens decrease with the twinning thickness becoming thinner.
引文
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