Axial profiles of argon helicon plasma by optical emission spectroscope and Langmuir probe
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摘要
We present the axial profiles of argon helicon plasma measured by a local optical emission spectroscope(OES) and Langmuir RF-compensated probe. The results show that the emission intensity of the argon atom lines(750 nm, 811 nm) is proportional to the plasma density determined by the Langmuir probe. The axial profile of helicon plasma depends on the discharge mode which changes with the RF power. Excited by helical antenna, the axial distribution of plasma density is similar to that of the external magnetic field in the capacitive coupled mode(E-mode). As the discharge mode changes into the inductively coupled mode(H-mode), the axial distribution of plasma density in the downstream can still be similar to that of the external magnetic field, but becomes more uniform in the upstream. When the discharge entered wave coupled mode(W-mode), the plasma becomes nearly uniform along the axis, showing a completely different profile from the magnetic field. The W-mode is expected to be a mixed pattern of helicon(H) and Trivelpiece-Gould(TG) waves.
We present the axial profiles of argon helicon plasma measured by a local optical emission spectroscope(OES) and Langmuir RF-compensated probe. The results show that the emission intensity of the argon atom lines(750 nm, 811 nm) is proportional to the plasma density determined by the Langmuir probe. The axial profile of helicon plasma depends on the discharge mode which changes with the RF power. Excited by helical antenna, the axial distribution of plasma density is similar to that of the external magnetic field in the capacitive coupled mode(E-mode). As the discharge mode changes into the inductively coupled mode(H-mode), the axial distribution of plasma density in the downstream can still be similar to that of the external magnetic field, but becomes more uniform in the upstream. When the discharge entered wave coupled mode(W-mode), the plasma becomes nearly uniform along the axis, showing a completely different profile from the magnetic field. The W-mode is expected to be a mixed pattern of helicon(H) and Trivelpiece-Gould(TG) waves.
We present the axial profiles of argon helicon plasma measured by a local optical emission spectroscope(OES) and Langmuir RF-compensated probe. The results show that the emission intensity of the argon atom lines(750 nm, 811 nm) is proportional to the plasma density determined by the Langmuir probe. The axial profile of helicon plasma depends on the discharge mode which changes with the RF power. Excited by helical antenna, the axial distribution of plasma density is similar to that of the external magnetic field in the capacitive coupled mode(E-mode). As the discharge mode changes into the inductively coupled mode(H-mode), the axial distribution of plasma density in the downstream can still be similar to that of the external magnetic field, but becomes more uniform in the upstream. When the discharge entered wave coupled mode(W-mode), the plasma becomes nearly uniform along the axis, showing a completely different profile from the magnetic field. The W-mode is expected to be a mixed pattern of helicon(H) and Trivelpiece-Gould(TG) waves.
引文
[1] Chen F F 2015 Plasma Sources Sci. Technol. 24 014001
[2] Shinohara S et al 2009 Phys. Plasmas 16 057104
[3] Takahashi K et al 2014 Plasma Sources Sci. Technol. 23 044004
[4] Takahashi K, Komuro A and Ando A 2015 Plasma Sources Sci. Technol. 24 055004
[5] Xia G Q et al 2015 Spacecraft Environ. Eng. 32 1(in Chinese)
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[7] Wang Y et al 2015 Phys. Plasmas 22 093507
[8] Barada K K et al 2013 Phys. Plasmas 20 012123
[9] Sato G, Oohara W and Hatakeyama R 2007 Plasma Sources Sci. Technol. 16 734
[10] Chen F F 2003 Phys. Plasmas 10 2586
[11] Siddiqui M U and Hershkowitz N 2014 Phys. Plasmas 21 020707
[12] Zhao G et al 2018 Plasma Sci. Technol. 20 075402
[13] Braginskii O V, Vasil’eva A N and Kovalev A S 2001 Plasma Phys. Rep. 27 699
[14] Ma C et al 2015 IEEE Trans. Plasma Sci. 43 3702
[15] Zhu X M et al 2006 Phys. Plasmas 13 123501
[16] Zhao G et al 2017 Phys. Plasmas 24 123507
[17] Shinohara S et al 2019 Plasma Phys. Controlied Fusion 61014017
[18] Curreli D and Chen F F 2011 Phys. Plasmas 18 113501
[19] Liu L et al 2009 Plasma Sci. Technol. 11 307
[20] Czerwiec T and Graves D B 2004 J. Phys. D:Appl. Phys. 37 2827
[21] Clarenbach B et al 2007 J. Phys. D:Appl. Phys. 40 5117
[22] Degeling A W et al 1996 Phys. Plasmas 3 2788
[23] Ellingboe A R et al 1996 Phys. Plasmas 3 2797
[24] Isayama S et al 2016 Phys. Plasmas 23 063513
[25] Shamrai K P and Taranov V B 1996 Plasma Sources Sci.Technol. 5 474
[26] Djermanova N et al 2004 Vacuum 76 389
[27] Afsharmanesh M and Habibi M 2017 Plasma Sci. Technol. 19105403
[28] Arnush D and Chen F F 1998 Phys. Plasmas 5 1239
[29] Chen F F 1991 Plasma Phys. Controlled Fusion 33 339
[30] Ganguli A, Sahu B B and Tarey R D 2007 Phys. Plasmas 14113503
[31] Wang Y 2017 Plasma Sci. Technol. 19 024003
[32] Celik M 2011 Spectrochim. Acta Part B At. Spectrosc. 66 149
[33] Chen F F 1992 J. Vac. Sci. Technol. A 10 1389
[34] Trivelpiece A W and Gould R W 1959 J. Appl. Phys. 30 1784
[35] Arnush D 2000 Phys. Plasmas 7 3042
[36] Ganguli A, Sahu B B and Tarey R D 2011 Plasma Sources Sci.Technol. 20 015021
[2] Shinohara S et al 2009 Phys. Plasmas 16 057104
[3] Takahashi K et al 2014 Plasma Sources Sci. Technol. 23 044004
[4] Takahashi K, Komuro A and Ando A 2015 Plasma Sources Sci. Technol. 24 055004
[5] Xia G Q et al 2015 Spacecraft Environ. Eng. 32 1(in Chinese)
[6] Wang S J et al 2007 J. Korean Phys. Soc. 51 989
[7] Wang Y et al 2015 Phys. Plasmas 22 093507
[8] Barada K K et al 2013 Phys. Plasmas 20 012123
[9] Sato G, Oohara W and Hatakeyama R 2007 Plasma Sources Sci. Technol. 16 734
[10] Chen F F 2003 Phys. Plasmas 10 2586
[11] Siddiqui M U and Hershkowitz N 2014 Phys. Plasmas 21 020707
[12] Zhao G et al 2018 Plasma Sci. Technol. 20 075402
[13] Braginskii O V, Vasil’eva A N and Kovalev A S 2001 Plasma Phys. Rep. 27 699
[14] Ma C et al 2015 IEEE Trans. Plasma Sci. 43 3702
[15] Zhu X M et al 2006 Phys. Plasmas 13 123501
[16] Zhao G et al 2017 Phys. Plasmas 24 123507
[17] Shinohara S et al 2019 Plasma Phys. Controlied Fusion 61014017
[18] Curreli D and Chen F F 2011 Phys. Plasmas 18 113501
[19] Liu L et al 2009 Plasma Sci. Technol. 11 307
[20] Czerwiec T and Graves D B 2004 J. Phys. D:Appl. Phys. 37 2827
[21] Clarenbach B et al 2007 J. Phys. D:Appl. Phys. 40 5117
[22] Degeling A W et al 1996 Phys. Plasmas 3 2788
[23] Ellingboe A R et al 1996 Phys. Plasmas 3 2797
[24] Isayama S et al 2016 Phys. Plasmas 23 063513
[25] Shamrai K P and Taranov V B 1996 Plasma Sources Sci.Technol. 5 474
[26] Djermanova N et al 2004 Vacuum 76 389
[27] Afsharmanesh M and Habibi M 2017 Plasma Sci. Technol. 19105403
[28] Arnush D and Chen F F 1998 Phys. Plasmas 5 1239
[29] Chen F F 1991 Plasma Phys. Controlled Fusion 33 339
[30] Ganguli A, Sahu B B and Tarey R D 2007 Phys. Plasmas 14113503
[31] Wang Y 2017 Plasma Sci. Technol. 19 024003
[32] Celik M 2011 Spectrochim. Acta Part B At. Spectrosc. 66 149
[33] Chen F F 1992 J. Vac. Sci. Technol. A 10 1389
[34] Trivelpiece A W and Gould R W 1959 J. Appl. Phys. 30 1784
[35] Arnush D 2000 Phys. Plasmas 7 3042
[36] Ganguli A, Sahu B B and Tarey R D 2011 Plasma Sources Sci.Technol. 20 015021