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CuAlO_2薄膜的Raman谱表征及介电行为研究
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  • 作者:江海锋 ; 汪贤才 ; 臧学平 ; 吴卫锋
  • 关键词:CuAlO2薄膜 ; Raman谱 ; 介电常数 ; 介电损耗
  • 中文刊名:CHXY
  • 英文刊名:Journal of Chaohu College
  • 机构:池州学院机械与电子工程系;
  • 出版日期:2013-05-25
  • 出版单位:巢湖学院学报
  • 年:2013
  • 期:v.15;No.120
  • 基金:安徽省自然科学基金青年项目(项目编号:1308085QA18);; 安徽省2011年度重点科研项目(项目编号:11070203010);; 安徽省高等学校省级自然科学研究项目(项目编号:KJ2013B172);; 池州学院研究生启动项目(项目编号:2011RC030)
  • 语种:中文;
  • 页:CHXY201303014
  • 页数:6
  • CN:03
  • ISSN:34-1260/Z
  • 分类号:57-62
摘要
本文研究了铜铁矿结构CuAlO2薄膜的变温Raman谱和介电行为。研究结果表明:体系存在电声子耦合,声子非谐衰减是峰频移动、峰宽展宽的主要原因。介电弛豫频率随温度的上升向高频方向移动,并且弛豫过程的激活能和电输运过程的激活能基本相当,说明两者间存在紧密的关联。该结果对进一步研究铜铁矿型材料的晶体结构和应用性能具有指导意义。
        
引文
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