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高功率脉冲和脉冲直流磁控共溅射CrAlN薄膜的研究
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  • 英文篇名:CrAlN Coatings Prepared by HiPIMS/Pulsed-DC Co-sputtering
  • 作者:郭玉垚 ; 王铁钢 ; 李柏松 ; 刘艳梅 ; 蒙德强 ; 许人仁
  • 英文作者:GUO Yu-yao;WANG Tie-gang;LI Bai-song;LIU Yan-mei;MENG De-qiang;XU Ren-ren;Tianjin Key Laboratory of High Speed Cutting and Precision Manufacturing, Tianjin University of Technology and Education;
  • 关键词:高功率脉冲磁控溅射 ; 脉冲直流磁控溅射 ; CrAlN薄膜 ; 力学性能 ; 磨擦磨损性能
  • 英文关键词:HiPIMS;;pulsed-DC magnetron sputtering;;CrAlN coating;;mechanical properties;;friction
  • 中文刊名:BMJS
  • 英文刊名:Surface Technology
  • 机构:天津职业技术师范大学天津市高速切削与精密加工重点实验室;
  • 出版日期:2019-04-20
  • 出版单位:表面技术
  • 年:2019
  • 期:v.48
  • 基金:国家自然科学基金项目(51301181,51875555);; 天津市科技军民融合重大专项项目(18ZXJMTG00050);; 中青年骨干创新人才培养计划项目(RC180203);; 天津职业技术师范大学校级科研项目(KJ1812);; 研究生创新基金项目(YC18-02)~~
  • 语种:中文;
  • 页:BMJS201904022
  • 页数:8
  • CN:04
  • ISSN:50-1083/TG
  • 分类号:151-158
摘要
目的通过掺杂适量Al元素来固溶强化Cr N薄膜,从而提高薄膜的抗氧化性能和热稳定性。方法采用高功率脉冲磁控溅射和脉冲直流磁控溅射复合镀膜技术制备了Cr Al N薄膜,利用XRD、纳米压痕仪、应力仪、摩擦磨损试验机系统地研究了不同基体偏压对CrAlN涂层结构和力学性能的影响。结果所有CrAlN涂层均以fcc-(Cr,Al)N相为主,且随着基体偏压的增加,沿(111)晶面生长的衍射峰逐渐减弱,并向小角度偏移;薄膜压应力显著增加,最大值为-2.68GPa;薄膜硬度先上升后下降,在基体偏压为-30V时,硬度达到最大值22.3 GPa;H/E值和H~3/E~(*2)值随着基体偏压的增加,近似线性增大,当偏压为-120 V时,均达最大值0.11、0.21 GPa,同时摩擦系数和磨损率逐渐减小。结论当基体偏压为-120 V时,CrAlN薄膜具有最佳的耐磨性能,H/E和H~3/E~(*2)在一定程度上可评价涂层的耐磨性。
        The work aims to strengthen CrN film through solid solution by doping appropriate amount of Al, so as to improve the oxidation resistance and thermal stability of the film. High power impulse magnetron sputtering and pulsed direct current magnetron sputtering were adopted to deposit Cr-Al-N films and the influence of different substrate biases on the structure and mechanical properties of the coating was studied by XRD, indentation tester, film stress tester and friction tests. All CrAlN coatings exhibited a face-centered cubic(Cr,Al)N solid solution phase. As the substrate bias increased, the diffraction peaks growing along the(111) plane gradually weakened and shifted toward a small angle; the compressive stress of the film increased remarkably; the hardness of the film rose first and then decreased, and the hardness reached a maximum value of 22.3 GPa when the substrate bias was -30 V. The H/E value and the H~3/E~(*2) value increased approximately linearly with the increase of the substrate bias voltage, and the maximum values were 0.11 and 0.21 at -120 V, respectively, and the friction coefficient and wear rate were gradually reduced. When the substrate bias is-120 V, the CrAlN film has the best wear resistance; H/E and H~3/E~(*2) can be used to evaluate the wear resistance of the coating.
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