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双波长数字显微像面全息术测量微结构表面形貌
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  • 英文篇名:Surface Profile Measurement of Microstructures Based on Dual-Wavelength Digital Microscopic Image-Plane Holography
  • 作者:曾雅楠 ; 汪飞 ; 雷海 ; 胡晓东 ; 胡小唐
  • 英文作者:Zeng Yanan;Wang Fei;Lei Hai;Hu Xiaodong;Hu Xiaotang;State Key Laboratory of Precision Measuring Technology and Instruments,Tianjin University;
  • 关键词:全息 ; 双波长数字全息 ; 数字显微像面全息 ; 形貌测量
  • 英文关键词:holography;;dual-wavelength digital holography;;digital microscopic image-plane holography;;profile measurement
  • 中文刊名:GXXB
  • 英文刊名:Acta Optica Sinica
  • 机构:天津大学精密测试技术及仪器国家重点实验室;
  • 出版日期:2013-10-10
  • 出版单位:光学学报
  • 年:2013
  • 期:v.33;No.379
  • 基金:国家自然科学基金(51075297,61223008)
  • 语种:中文;
  • 页:GXXB201310014
  • 页数:5
  • CN:10
  • ISSN:31-1252/O4
  • 分类号:82-86
摘要
为了扩大传统双波长数字全息显微技术在实时微结构表面形貌测试中的有效测量视场,提高实时响应速度并降低噪声,将传统双波长数字全息术和数字显微像面全息术相结合,提出了一种双波长数字显微像面全息方法。该方法在记录像面全息图后,无需进行衍射重构,直接在全息面提取相位和强度信息达到测量样本形貌的目的。基于该方法对微米级高度的台阶结构进行三维形貌测试,同时对比了传统双波长数字全息显微系统和机械探针轮廓仪的微台阶测试结果。从三者的对比分析中可知,双波长数字显微像面全息的这种测试技术是有效可行的,且具有单曝光、全视场,响应速度快以及噪声较低的特点,对于阶跃高度达到微米级的微器件形貌测试尤为适用。
        To enlarge the effective field of view,speed up the response time and reduce the noise of the real-time surface profile measurement of microstructures by traditional dual-wavelength digital holographic microscopy,a technique named dual-wavelength digital microscopic image-plane holography is developed.It is a combination of digital microscopic image-plane holography and the traditional dual-wavelength digital holographic microscopy.The phase and amplitude can be directly extracted from the hologram plane to yield the surface profile of microstructure without calculation of the diffraction after recording the image-plane hologram.A microstep with several micrometers in height is tested by the dual-wavelength digital image-plane holographic microscope,the traditional digital holographic microscope and the stylus profilometer.As can be seen from the comparison of the testing results,the dualwavelength digital microscopic image-plane holography is feasible with the characteristics of single-exposure,completely full-field,short response time and low noises.It is especially suitable for the real-time surface profile measurement of microstructures with step height in the micrometer range.
引文
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