光刻机照明系统光瞳特性参数的评估算法
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摘要
针对光刻机照明系统的实际应用需求,提出了一种光瞳特性参数的评估算法。该算法通过对光瞳强度分布进行转换,可以在不同照明模式下同时计算光瞳椭圆度、X方向光瞳极平衡性、Y方向光瞳极平衡性和四象限光瞳极平衡性等多种光瞳特性参数。以一种28 nm节点扫描光刻机照明系统的中继镜组为实例,对其在传统照明模式下进行光瞳特性参数计算分析。仿真结果显示,全视场光瞳椭圆度最大值为0.95%,X方向和Y方向光瞳极平衡性最大值分别为0.18%和0.19%,四象限光瞳极平衡性最大值为0.66%,均满足28 nm节点扫描光刻机实际指标需求。所提算法在光学设计阶段能快速评估光瞳性能。
An evaluation algorithm of the pupil characteristic parameters is proposed, aiming at the practical application requirements of lithography illumination system. By changing the intensity distribution of pupil, this algorithm can be used to simultaneously calculate the pupil ellipticity, non-balance_X, non-balance_Y, non-balance_quad, and other pupil characteristic parameters in different illumination modes. The relay lens set of the 28 nm node scanning lithography illumination system is used as an example and the pupil characteristic parameters under the traditional illumination mode are analyzed. The simulation results show that the maximum value of pupil ellipticity in the full field of view is 0.95%, and the maximum values of non-balance_X and non-balance_Y are 0.18% and 0.19%, respectively. In addition, the maximum value of non-balance_quad is 0.66%. These data satisfy the actual index requirements of the 28 nm node scanning lithography. The proposed algorithm can help to evaluate the pupil performances quickly at the optical design stage.
An evaluation algorithm of the pupil characteristic parameters is proposed, aiming at the practical application requirements of lithography illumination system. By changing the intensity distribution of pupil, this algorithm can be used to simultaneously calculate the pupil ellipticity, non-balance_X, non-balance_Y, non-balance_quad, and other pupil characteristic parameters in different illumination modes. The relay lens set of the 28 nm node scanning lithography illumination system is used as an example and the pupil characteristic parameters under the traditional illumination mode are analyzed. The simulation results show that the maximum value of pupil ellipticity in the full field of view is 0.95%, and the maximum values of non-balance_X and non-balance_Y are 0.18% and 0.19%, respectively. In addition, the maximum value of non-balance_quad is 0.66%. These data satisfy the actual index requirements of the 28 nm node scanning lithography. The proposed algorithm can help to evaluate the pupil performances quickly at the optical design stage.
引文
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[7] Guo L P, Huang H J, Wang X Z. Off-axis illumination for optical lithography[J]. Laser Journal, 2005, 26(1): 23-25. 郭立萍, 黄惠杰, 王向朝. 光学光刻中的离轴照明技术[J]. 激光杂志, 2005, 26(1): 23-25.
[8] Childers J E, Baker T, Emig T, et al. Advanced testing requirements of diffractive optical elements for off-axis illumination in photolithography[J]. SPIE, 2009, 7430: 74300S.
[9] Kamon K, Miyamoto T, Myoi Y, et al. Photolithography system using annular illumination[J]. Japanese Journal of Applied Physics, 1991, 30(11B): 3021-3029.
[10] Hu Z H, Zhu J, Yang B X, et al. Far-field multi-parameter measurement of diffractive optical element for pupil shaping in lithography system[J]. Chinese Journal of Lasers, 2013, 40(9): 0908001. 胡中华, 朱菁, 杨宝喜, 等. 光刻机光瞳整形衍射光学元件远场多参数检测方法[J]. 中国激光, 2013, 40(9): 0908001.
[11] Guo L P, Wang X Z, Huang H J. Impact of illumination pupil filling unbalance on imaging performance of lithography[J]. Acta Optica Sinica, 2006, 26(6): 885-890. 郭立萍, 王向朝, 黄惠杰. 照明光瞳非对称性对光刻成像质量的影响[J]. 光学学报, 2006, 26(6): 885-890.
[12] Chen A, Lin W M, Jiang H B. Impact of non-ideal illumination pupil on imaging performance of lithography[J]. Opto-Electronic Engineering, 2013, 40(2): 87-92. 陈安, 林妩媚, 江海波. 非理想照明光瞳对光刻成像质量的影响[J]. 光电工程, 2013, 40(2): 87-92.
[13] Rui D W, Shi Z G, Yuan W Q, et al. Pupil non-balance calibration for lithographic lens[J]. Chinese Journal of Lasers, 2014, 41(9): 0916002. 芮大为, 史振广, 袁文全, 等. 光刻物镜光瞳极平衡性标定方法[J]. 中国激光, 2014, 41(9): 0916002.
[2] Hu Z H, Yang B X, Zhu J, et al. Pupil shaping techniques in high resolution projection exposure tools[J]. Laser & Optoelectronics Progress, 2011, 48(11): 111101. 胡中华, 杨宝喜, 朱菁, 等. 高分辨率投影光刻机光瞳整形技术[J]. 激光与光电子学进展, 2011, 48(11): 111101.
[3] Matsuyama T, Ohmura Y, Williamson D M. The lithographic lens: its history and evolution[J]. SPIE, 2006, 6154: 614503.
[4] Cheng W L, Zhang F, Lin D L, et al. Multi-degree-of-freedom uniformity correction method of illumination system in lithography machine[J]. Acta Optica Sinica, 2018, 38(10): 1022004. 程伟林, 张方, 林栋梁, 等. 光刻机照明系统的多自由度均匀性校正方法[J]. 光学学报, 2018, 38(10): 1022004.
[5] Cheng W L, Zhang F, Lin D L, et al. High precision correction method of illumination field uniformity for photolithography illumination system[J]. Acta Optica Sinica, 2018, 38(7): 0722001. 程伟林, 张方, 林栋梁, 等. 光刻机照明光场均匀性高精度校正方法研究[J]. 光学学报, 2018, 38(7): 0722001.
[6] Cai Y M, Wang X Z, Bu Y, et al. Optical design of Fourier transform lens for measurement of illumination pupil of lithography tools[J]. Chinese Journal of Lasers, 2015, 42(4): 0416001. 蔡燕民, 王向朝, 步扬, 等. 光刻机光瞳整形衍射光学元件远场多参数检测方法[J]. 中国激光, 2015, 42(4): 0416001.
[7] Guo L P, Huang H J, Wang X Z. Off-axis illumination for optical lithography[J]. Laser Journal, 2005, 26(1): 23-25. 郭立萍, 黄惠杰, 王向朝. 光学光刻中的离轴照明技术[J]. 激光杂志, 2005, 26(1): 23-25.
[8] Childers J E, Baker T, Emig T, et al. Advanced testing requirements of diffractive optical elements for off-axis illumination in photolithography[J]. SPIE, 2009, 7430: 74300S.
[9] Kamon K, Miyamoto T, Myoi Y, et al. Photolithography system using annular illumination[J]. Japanese Journal of Applied Physics, 1991, 30(11B): 3021-3029.
[10] Hu Z H, Zhu J, Yang B X, et al. Far-field multi-parameter measurement of diffractive optical element for pupil shaping in lithography system[J]. Chinese Journal of Lasers, 2013, 40(9): 0908001. 胡中华, 朱菁, 杨宝喜, 等. 光刻机光瞳整形衍射光学元件远场多参数检测方法[J]. 中国激光, 2013, 40(9): 0908001.
[11] Guo L P, Wang X Z, Huang H J. Impact of illumination pupil filling unbalance on imaging performance of lithography[J]. Acta Optica Sinica, 2006, 26(6): 885-890. 郭立萍, 王向朝, 黄惠杰. 照明光瞳非对称性对光刻成像质量的影响[J]. 光学学报, 2006, 26(6): 885-890.
[12] Chen A, Lin W M, Jiang H B. Impact of non-ideal illumination pupil on imaging performance of lithography[J]. Opto-Electronic Engineering, 2013, 40(2): 87-92. 陈安, 林妩媚, 江海波. 非理想照明光瞳对光刻成像质量的影响[J]. 光电工程, 2013, 40(2): 87-92.
[13] Rui D W, Shi Z G, Yuan W Q, et al. Pupil non-balance calibration for lithographic lens[J]. Chinese Journal of Lasers, 2014, 41(9): 0916002. 芮大为, 史振广, 袁文全, 等. 光刻物镜光瞳极平衡性标定方法[J]. 中国激光, 2014, 41(9): 0916002.