行星运动方式下不同形状磨头的去除函数
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摘要
为了在光学元件的加工中获取更加接近高斯型的去除函数,本文基于传统行星运动抛光理论,提出了用自转去除函数公转轨迹积分较方便地求取各种复杂形状磨头去除函数的方法。当转速比大于10时,新方法与传统方法得到的实心圆盘去除函数曲线非常接近,从而验证了提出方法的正确性。采用新方法推导了不同形状磨头的去除函数,并通过计算机进行了仿真实验。实验显示:磨头形状为Ⅱ型花瓣,偏心率为0.4时,可以获得非常接近高斯型的去除函数。针对Ⅱ型花瓣磨头进行了抛光试验,结果表明,当偏心率为0.4、转速比为10时,试验结果与仿真结果非常吻合,且都非常接近高斯型去除函数。实验结果再次验证了新方法的正确性。
To obtain Gaussian-like removal function in optical manufacturing process,a convenient method to derive the removal functions of various complicated polishing heads by integrating the rotation removal function along the revolution trajectory was proposed based on the traditional planet polising theory.When the speed ratio was greater than 10,the removal function curve of a solid disk by the proposed method was very close to the result by the traditional method,which verifies the correctness of the proposed method.The proposed method was used to derive polishing removal functions of different polishing heads.By computer simulation,it shows that type Ⅱ petal polishing head gets a better removal function curve when the eccentricity ratio is 0.4.Finally,the type Ⅱ petal polishing head was polished,and the results indicate that when the eccentricity ratio was 0.4 and the speed ratio is 10,the test and simulation results are consistent with each other and they are all close to the Gaussi-an curve.These test result verifies the correctness of the proposed method again.
To obtain Gaussian-like removal function in optical manufacturing process,a convenient method to derive the removal functions of various complicated polishing heads by integrating the rotation removal function along the revolution trajectory was proposed based on the traditional planet polising theory.When the speed ratio was greater than 10,the removal function curve of a solid disk by the proposed method was very close to the result by the traditional method,which verifies the correctness of the proposed method.The proposed method was used to derive polishing removal functions of different polishing heads.By computer simulation,it shows that type Ⅱ petal polishing head gets a better removal function curve when the eccentricity ratio is 0.4.Finally,the type Ⅱ petal polishing head was polished,and the results indicate that when the eccentricity ratio was 0.4 and the speed ratio is 10,the test and simulation results are consistent with each other and they are all close to the Gaussi-an curve.These test result verifies the correctness of the proposed method again.
引文
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[4]JONES R A.Fabrication of a large,thin,off-axis aspheric mirror[J].Optical Engineering,1994,33(12):4067-4075.
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[12]樊成,赵继,张雷,等.移动抛光自由曲面材料去除的理论建模与试验研究[J].机械工程学报,2014,50(5):173-181.FAN CH,ZHAO J,ZHANG L,et al..Modeling and experimental study on the material removal in the velocity-dwell-mode polishing process[J].Journal of Mechanical Engineering,2014,50(5):173-181.(in Chinese)
[13]XU L,DING J T,MA Z,et al..Kinematical analysis of one-axis polisher acting on spherical mirror[J].Proceedings of SPIE,2012,8416:84162H.
[14]吴宏基,曹利新,刘健.基于行星式平面研磨机研抛过程的运动几何学分析[J].机械工程学报,2002,38(6):144-147.WU H J,CAO L X,LIU J.Analysis of kinematic geometry on face grinding process on lapping machines[J].Chinese Journal of Mechanical Engineering,2002,38(6):144-147.(in Chinese)
[15]尚文锦.计算机控制确定性研抛的建模与仿真[D].长沙:国防科学技术大学,2005.SHANG W J.Model building and simulation of computer control deterministic grinding and polishing[D].Changsha:National University of Defense Technology,2005.(in Chinese)
[16]王权陡,刘民才,张洪霞.数控抛光技术中抛光盘的去除函数[J].光学技术,2000,26(1):32-34.WANG Q D,LIU M C,ZHANG H X.Removing function of polishing pad in computer controlled optical polishing[J].Optical Technique,2000,26(1):32-34.(in Chinese)
[17]李徐钰,魏朝阳,徐文东,等.随动压力分布下的非球面抛光去除函数[J].光学精密工程,2016,24(12):3061-3067.LI X Y,WEI CH Y,XU W D,et al..Tool influence function in aspheric polishing under dynamic pressure distribution[J].Opt.Precision Eng.,2016,24(12):3061-3067.(in Chinese)
[18]戴一帆,尚文锦,周旭升.计算机控制小工具抛光技术中磨盘材料对去除函数的影响[J].国防科技大学学报,2006,28(2):97-101.DAI Y F,SHANG W J,ZHOU X S.Effection of the material of a small tool to the removal function in computer control optical polishing[J].Journal of National University of Defense Technology,2006,28(2):97-101.(in Chinese)
[19]刘德福,陈涛,陈广林,等.软性粒子抛光石英玻璃的材料去除机理[J].光学精密工程,2016,24(7):1623-1631.LIU D F,CHEN T,CHEN G L,et al..Material removal mechanism for fused glass by using soft particles[J].Opt.Precision Eng.,2016,24(7):1623-1631.(in Chinese)
[2]薛栋林,张忠玉,张学军.一种中小口径非球面元件数控抛光技术[J].光学精密工程,2005,13(2):198-204.XUE D L,ZHANG ZH Y,ZHANG X J.Computer controlled polishing technology for middle or small aspheric lens[J].Opt.Precision Eng.,2005,13(2):198-204.(in Chinese)
[3]JONES R A,RUPP W J.Rapid optical fabrication with computer controlled optical surfacing[J].Optical Engineering,1991,30(12):19.
[4]JONES R A.Fabrication of a large,thin,off-axis aspheric mirror[J].Optical Engineering,1994,33(12):4067-4075.
[5]JONES R A.Computer simulation of smoothing during computer-controlled optical polishing[J].Applied Optics,1995,34(7):1162-1169.
[6]RUPP W,PLOTSKER V.Vacuum activated polishing laps produce smooth aspheric surfaces[J].Applied Optics,1993,32(7):1048-1050.
[7]王朋,陈亚,宣斌,等.大口径光学元件的机械手抛光[J].光学精密工程,2010,18(5):1077-1085.WANG P,CHEN Y,XUAN B,et al..Polishing large aperture mirrors by manipulator[J].Opt.Precision Eng.,2010,18(5):1077-1085.(in Chinese)
[8]李爱民,戴一帆,郑子文,等.双转子研抛模去除函数的研究[J].中国机械工程,2004,15(23):2077-2081.LI A M,DAI Y F,ZHENG Z W,et al..Study on removing function of the polishing pad of dual-rotator mechanism[J].China Mechanical Engineering,2004,15(23):2077-2081.(in Chinese)
[9]JONES R A.Computer-controlled optical surfacing with orbital tool motion[J].Optical Engineering,1986,25(6):785.
[10]GRANADE S R,DRUEDING T W.Variation in material removal in Gaussian removal processes[J].Optical Engineering,1996,35(11):3267-3269.
[11]陈华男,王君林,李显凌,等.光学元件双转子抛光技术中类高斯型去除函数建模与逼近[J].光子学报,2013,42(3):282-287.CHEN H N,WANG J L,LI X L,et al..Modelling and approximation of gaussian-like removal function in dual-rotor polishing technology of optics elements[J].Acta Photonica Sinica,2013,42(3):282-287.(in Chinese)
[12]樊成,赵继,张雷,等.移动抛光自由曲面材料去除的理论建模与试验研究[J].机械工程学报,2014,50(5):173-181.FAN CH,ZHAO J,ZHANG L,et al..Modeling and experimental study on the material removal in the velocity-dwell-mode polishing process[J].Journal of Mechanical Engineering,2014,50(5):173-181.(in Chinese)
[13]XU L,DING J T,MA Z,et al..Kinematical analysis of one-axis polisher acting on spherical mirror[J].Proceedings of SPIE,2012,8416:84162H.
[14]吴宏基,曹利新,刘健.基于行星式平面研磨机研抛过程的运动几何学分析[J].机械工程学报,2002,38(6):144-147.WU H J,CAO L X,LIU J.Analysis of kinematic geometry on face grinding process on lapping machines[J].Chinese Journal of Mechanical Engineering,2002,38(6):144-147.(in Chinese)
[15]尚文锦.计算机控制确定性研抛的建模与仿真[D].长沙:国防科学技术大学,2005.SHANG W J.Model building and simulation of computer control deterministic grinding and polishing[D].Changsha:National University of Defense Technology,2005.(in Chinese)
[16]王权陡,刘民才,张洪霞.数控抛光技术中抛光盘的去除函数[J].光学技术,2000,26(1):32-34.WANG Q D,LIU M C,ZHANG H X.Removing function of polishing pad in computer controlled optical polishing[J].Optical Technique,2000,26(1):32-34.(in Chinese)
[17]李徐钰,魏朝阳,徐文东,等.随动压力分布下的非球面抛光去除函数[J].光学精密工程,2016,24(12):3061-3067.LI X Y,WEI CH Y,XU W D,et al..Tool influence function in aspheric polishing under dynamic pressure distribution[J].Opt.Precision Eng.,2016,24(12):3061-3067.(in Chinese)
[18]戴一帆,尚文锦,周旭升.计算机控制小工具抛光技术中磨盘材料对去除函数的影响[J].国防科技大学学报,2006,28(2):97-101.DAI Y F,SHANG W J,ZHOU X S.Effection of the material of a small tool to the removal function in computer control optical polishing[J].Journal of National University of Defense Technology,2006,28(2):97-101.(in Chinese)
[19]刘德福,陈涛,陈广林,等.软性粒子抛光石英玻璃的材料去除机理[J].光学精密工程,2016,24(7):1623-1631.LIU D F,CHEN T,CHEN G L,et al..Material removal mechanism for fused glass by using soft particles[J].Opt.Precision Eng.,2016,24(7):1623-1631.(in Chinese)
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