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pH和溶解性有机质对磺胺甲恶唑光降解的影响
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  • 英文篇名:Effects of pH and dissolved organic matter on sulfamethoxazole photodegradation
  • 作者:赵芙蓉 ; 王飞 ; 耿环环 ; 韩晓敏
  • 英文作者:ZHAO Furong;WANG Fei;GENG Huanhuan;HAN Xiaomin;School of Energy & Environmental Engineering,University of Science and Technology Beijing;
  • 关键词:人工合成抗菌药物降解 ; 磺胺甲恶唑光降解 ; 水中溶解性有机质 ; 水溶态腐殖酸
  • 英文关键词:synthetic antimicrobial degradation;;sulfamethoxazole photolydegradation;;dissolved organic matter;;water-soluble humic acid
  • 中文刊名:HJJZ
  • 英文刊名:Chinese Journal of Environmental Engineering
  • 机构:北京科技大学能源与环境工程学院;
  • 出版日期:2019-02-26
  • 出版单位:环境工程学报
  • 年:2019
  • 期:v.13
  • 基金:国家自然科学基金资助项目(41473096,41822706);; 北京市自然科学基金资助项目(8182034)
  • 语种:中文;
  • 页:HJJZ201902015
  • 页数:9
  • CN:02
  • ISSN:11-5591/X
  • 分类号:110-118
摘要
为了考察pH和溶解性有机质(DOM)对磺胺甲恶唑(SMX)自然光降解的影响,采用光化学反应器对SMX降解过程进行模拟实验,并利用傅里叶变换红外光谱(FT-IR)和三维荧光光谱(3DEEM)对腐殖酸进行表征。结果表明:SMX光解过程符合准一级反应动力学方程,在中等酸性条件下反应速率明显高于中性或碱性条件;添加不同浓度的Pahokee泥炭腐殖酸(PPHA)和Sigma-Aldrich腐殖酸(SigHA)时,均对SMX的光降解产生了不同程度的抑制作用;FT-IR检测发现,PPHA与SigHA均含有含氧官能团,具有一定的还原能力,3DEEM显示PPHA具有荧光特性,可能和SMX结合生成配合物。pH影响SMX的光解与物质本身的酸离解常数有关,对光子的竞争、淬灭作用和掩蔽效应可能是PPHA和SigHA对SMX光降解抑制作用的主要原因。
        In order to investigate the effects of pH and dissolved organic matter(DOM) on natural photodegradation of sulfamethoxazole(SMX), a photochemical reactor was used to simulate the SMX degradation process, and Fourier transform infrared spectroscopy(FT-IR) and three-dimensional fluorescence spectroscopy(3 DEEM) was used to characterize humic acid. Results showed that SMX photolysis process was well fitted to the first-order reaction kinetics, and its degradation rate was faster under moderate acidic conditions than under neutral or alkaline conditions. The addition of pahokee peat humic acid(PPHA) or Sigma-Aldrich humic acid(SigHA) with different concentrations inhibited SMX photodegradation by different degrees. FT-IR showed that PPHA and SigHA contained oxygen-containing functional groups and presented a certain reduction capacity.3 DEEM showed that PPHA had fluorescence characteristics and could form complexes with SMX. The effect of pH on SMX photolysis was related to its own acid dissociation constant, and PPHA or SigHA inhibitions on SMX photodegradation could be described to their photon competition, quenching and masking effects.
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