X-ray diffraction on nanocrystalline Ti_1−xAl_xN thin films

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• 作者：Rafaja ; D. ; í ; ma ; M. ; Klemm ; V. ; Schreiber ; G. ; Heger ; D. ; Havela ; L. ; Kuzel ; R.
• 关键词：Thin films ; Nanostructures ; Vapour deposition ; X-ray diffraction ; TEM
• 刊名：Journal of Alloys and Compounds
• 出版年：2004
• 期刊代码：45_09258388
• 类别：ms
• 出版时间：September 22, 2004
• 卷：378
• 期：1-2
• 页码：107-111
• 文件大小：342 K

摘要

Microstructure of titanium aluminium nitride thin films deposited using arc evaporation was investigated for different aluminium contents. From Ti_0.96Al_0.04N to Ti_0.38Al_0.62N, the dominant phase in the coatings was the fcc Ti_1−xAl_xN. In this concentration range, the compressive residual stress as well as the hardness of the coatings increased with increasing aluminium contents. Crystallites of Ti_1−xAl_xN were strongly textured; the preferred orientation was found to be related to the deposition geometry, not to the composition of the coatings. Concurrently, preferred orientation of crystallites was found to be a very important parameter influencing the crystal anisotropy of lattice deformation and the coherence of neighbouring crystallites. At higher aluminium contents (x>0.8), the dominant phase was the hexagonal AlN; the hardness of the films decreased.