Enhanced localized near field and scattered far field for surface nanophotonics applications

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• 作者：Mitsuhiro Terakawa^a ; Seiji Takeda^a ; ^c ; Yuto Tanaka^a ; Go Obara^a ; Tomoya Miyanishi^a ; Tetsuo Sakai^a ; Tetsumi Sumiyoshi^b ; Hitoshi Sekita^b ; Makoto Hasegawa^a ; Pierre Viktorovitch^c ; Minoru Obara^a ; ^{minoruobara@aol.com}
• 关键词：Near field ; Nanoprocessing ; Surface ripple structures ; Random lasing ; Anderson localization ; Random photonic crystal
• 刊名：Progress in Quantum Electronics
• 出版年：2012
• 期刊代码：91_00796727
• 类别：ms
• 出版时间：January, 2012
• 卷：36
• 期：1
• 页码：194-271
• 文件大小：9703 K

摘要

The scattering physics of photons is traced back to Rayleigh scattering theory in 1871 and Mie scattering theory in 1908. However, the scattering near field and far field have recently emerged again as a new fundamental physics and innovative nanoprocessing technology in quantum electronics and photonic devices. An enhanced near field generated by plasmonic particles can concentrate optical energy into a nanoscale space as a nanolens even with near infrared laser pumping. This plasmonic nanophotonics extends the existing optical science to a new class of photonics inclusive of surface enhanced Raman scattering, nanoprocessing of advanced electronic and photonic materials, etc. The Mie scattering near field also opens up new fields. The Anderson localization of light in a planar random photonic crystal laser is also a new class of quantum electronics devices, where Slow Bloch Mode is scattered by artificial structural randomness in a photonic crystal. In this contribution we will review the recent efforts of our scattering photonics research, which have resulted in significant advances in the plasmonic surface photonics of near-field and far-field nano/micro photonics and the Anderson localization in random lasing.