TOF-SIMS Analysis Using C60. Effect of Impact Energy on Yield and Damage

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• 作者：John S. Fletcher ; Xavier A. Conlan ; Emrys A. Jones ; Greg Biddulph ; Nicholas P. Lockyer ; and John C. Vickerman
• 刊名：Analytical Chemistry
• 出版年：2006
• 出版时间：March 15, 2006
• 年：2006
• 卷：78
• 期：6
• 页码：1827 - 1831
• 全文大小：190K
• 年卷期：v.78,no.6(March 15, 2006)
• ISSN：1520-6882

文摘

C₆₀ has been shown to give increased sputter yields and,hence, secondary ions when used as a primary particlein SIMS analysis. In addition, for many samples, there isalso a reduction in damage accumulation following continued bombardment with the ion beam. In this paper,we report a study of the impact energy (up to 120 keV) ofC₆₀ on the secondary ion yield from a number of sampleswith consideration of any variation in yield response overmass ranges up to m/z 2000. Although increased impactenergy is expected to produce a corresponding increasein sputter yield/rate, it is important to investigate anyincrease in sample damage with increasing energy and,hence, efficiency of the ion beams. On our test samplesincluding a metal, along with organic samples, there is ageneral increase in secondary ion yield of high-massspecies with increasing impact energy. A correspondingreduction in the formation of low-mass fragments is alsoobserved. Depth profiling of organic samples demonstrates that when using C₆₀, there does not appear to beany increase in damage evident in the mass spectra asthe impact energy is increased.