Sub-10 nm Self-Enclosed Self-Limited Nanofluidic Channel Arrays

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• 作者：Qiangfei Xia ; Keith J. Morton ; Robert H. Austin ; Stephen Y. Chou
• 刊名：Nano Letters
• 出版年：2008
• 出版时间：November 12, 2008
• 年：2008
• 卷：8
• 期：11
• 页码：3830-3833
• 全文大小：182K
• 年卷期：v.8,no.11(November 12, 2008)
• ISSN：1530-6992

文摘

We report a new method to fabricate self-enclosed optically transparent nanofluidic channel arrays with sub-10 nm channel width over large areas. Our method involves patterning nanoscale Si trenches using nanoimprint lithography (NIL), sealing the trenches into enclosed channels by ultrafast laser pulse melting and shrinking the channel sizes by self-limiting thermal oxidation. We demonstrate that 100 nm wide Si trenches can be sealed and shrunk to 9 nm wide and that λ-phage DNA molecules can be effectively stretched by the channels.