Laboratory LPP EUV reflectometer working with non-polarized radiation

详细信息    查看全文

• 作者：Ludwig van Loyen ; Thomas Bö ; ttger ; Stefan Schä ; dlich ; Stefan Braun ; Thomas Foltyn ; Andreas Leson ; Frank Scholze and Stephan Mü ; llender
• 关键词：Extreme ultraviolet ; Metrology ; Lithography ; At-wavelength characterization ; Reflectometry
• 刊名：Applied Surface Science
• 出版年：2005
• 出版时间：2005
• 年：2005
• 卷：252
• 期：1
• 页码：57-60
• 全文大小：243 K

文摘

A laboratory extreme ultraviolet reflectometer (EUVR) for the wavelength range from 10 to 16 nm was built at IWS Dresden using a gold target laser pulse plasma (Au-LPP) source. The peak reflectance and the center wavelength are reproduced in relative standard deviation of 0.2 and 0.02 % , respectively. In contrast to measurements using linearly polarized s-adjusted synchrotron radiation at PTB, measurements with non-polarized radiation at the EUVR yield systematically lower values for the reflectance due to the smaller reflectance of the p-component at higher angles of incidence.