Roughness kinetic and multiaffinity of anisotropic etched silicon

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• 作者：S. Hosseinabadi^a ; ^{shoseinabadi@iauet.ac.ir} ; M. Rajabi^b
• 关键词：Anisotropic etching ; Silicon surfaces ; Roughness kinetic ; Multifractal nature ; MFDMA
• 刊名：Superlattices and Microstructures
• 出版年：2017
• 出版时间：February 2017
• 年：2017
• 卷：102
• 期：Complete
• 页码：180-188
• 全文大小：1397 K
• 卷排序：102

文摘

Morphology evolution of silicon wafers during anisotropic etching is investigated. Roughness changes periodically in time with a decreasing exponentially trend. Pyramid structures disappear in large times and porous structures form. Mono-scaling of un-etched silicon changes to multifractality with etching time. Deviated normal distribution and different correlations are source of multifractality.