Effects of 3D microlens transfer into fused silica substrate by CF4/O2 dry etching
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- 作者：Viktoras Grigaliūnasa ; Viktoras.Grigaliunas@ktu.lt" class="auth_mail" title="E-mail the corresponding author ; Dalius Juciusa ; Algirdas Lazauskasa ; Mindaugas Andrulevičiusa ; Jolita Sakaliūnienėa ; Brigita Abakevičienėa ; Vitoldas Kopustinskasa ; Saulius Smetonab ; Sigitas Tamulevičiusa
- 关键词：Microlens ; e-Beam patterning ; PMMA ; Dry etching ; Fused silica
- 刊名：Applied Surface Science
- 出版年：2017
- 出版时间：30 January 2017
- 年：2017
- 卷：393
- 期：Complete
- 页码：287-293
- 全文大小：1548 K
文摘
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The etching rate of PMMA is dependent on the plasma etching time.
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The etching rate ratio between PMMA and fused silica vary during plasma treatment.
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The etching rate ratio variation must be assessed during the microlens design phase.